2004
DOI: 10.1109/tps.2004.823975
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Simulation of Capacitively Coupled Single- and Dual-Frequency RF Discharges

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Cited by 101 publications
(101 citation statements)
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“…The proposal made in [31] was that electron-electron collisions between the cold and hot electrons is the dominant heating mechanism for low-energy electrons. However, there are a number of particle simulation studies [32][33][34], including one by the present author, that show reasonable agreement with this or similar experiments without including electron-electron collisions, and a larger number of studies of related problems, e.g., [35][36][37][38][39][40][41][42], also neglecting electron-electron collisions. In this section, we re-examine these simulation results, with special attention to convergence with respect to N D .…”
Section: A Radio Frequency Discharge In Argonsupporting
confidence: 66%
“…The proposal made in [31] was that electron-electron collisions between the cold and hot electrons is the dominant heating mechanism for low-energy electrons. However, there are a number of particle simulation studies [32][33][34], including one by the present author, that show reasonable agreement with this or similar experiments without including electron-electron collisions, and a larger number of studies of related problems, e.g., [35][36][37][38][39][40][41][42], also neglecting electron-electron collisions. In this section, we re-examine these simulation results, with special attention to convergence with respect to N D .…”
Section: A Radio Frequency Discharge In Argonsupporting
confidence: 66%
“…Various physical mechanisms produce coupling between the two frequencies, and these effects have been explored in general terms in a number of recent papers, e.g. [1,2,3,4,5,6]. The purpose of the present paper is to discuss the electron heating mechanisms that operate in dual-frequency discharges-in particular, to elucidate their nature and significance, and as far as possible supply convenient formulae that may be used as elements in a comprehensive theoretical understanding of these discharges.…”
Section: Introductionmentioning
confidence: 99%
“…Various material processing applications include RF sputtering for thin film deposition, directional surface etching and plasma cleaning. [2][3][4][5] The microelectronics industry widely uses plasma discharges for various treatments of semiconductor materials. 6 Plasma discharges have biological applications in the form of sterilization, cell removal and printing of protein onto polymer substrates.…”
Section: Introductionmentioning
confidence: 99%
“…Cylindrical Capacitively Coupled Radio Frequency (CCRF) discharges have been simulated and analyzed using the PIC/MCC method in previous research by Lee et al 4,5 Dual frequency discharges were explored, and it was found that dual frequency sources allow independent control over plasma density and ion energy. Simulation results show that the plasma density, and subsequently the sheath width, is increased as the lowfrequency source voltage is increased.…”
mentioning
confidence: 99%