“…We have investigated a large number of low dimensional material systems, including GaN/InGaN quantum well structures [21], GaAs/InGaAs quantum well structures [20], and GaAs/InAs quantum dot (QD) structures [29], all of which indicate that, when the thickness of the MQWs structure region is less than 100 nm, more than 85% of carriers can escape by comparing their integral strength of the PL peak under the OC and SC states. This special structure can be used to make new types of optoelectronic devices, such as quantum well solar cells and photodetectors (IQWIP) [25,30], which widen the range of applications of quantum wells. Meanwhile, as for the NIN structure that the MQW structures are placed into in the depletion region of the NN junction (NIN structure), there is no obvious fluorescence quenching phenomenon in the case of SC, even if bias voltage is applied [21,22,31].…”