Simulation of ion beam direct structuring for 3D nanoimprint template fabrication

Platzgummer, Elmar; Biedermann, A.; Langfischer, H.; Eder-Kapl, Stefan; Kuemmel, Marco; Cernusca, S.; Loeschner, Hans; Lehrer, C.; Frey, L.; Lugstein, Alois; Bertagnolli, E.

doi:10.1016/j.mee.2006.01.140

Cited by 44 publications

(37 citation statements)

References 2 publications

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“…The TRIDYN code was used to obtain angle-dependent sputter yields, but the redeposition effect is not considered in DINESE code which means that it is only applicable to simulate the machining of low-aspect-ratio structures. Biedermann and Platzgummer developed a software package called Ionshaper [33] which included first-and second-order sputtering as well as the first-and second-order redeposition of sputtered atoms. The natural erosion process was characterised by a surface velocity vector normal to the surface and a surface shape with a fully continuous derivative.…”

Section: Surface Topography Simulation In Fib Machiningmentioning

confidence: 99%

Deterministic Fabrication of Micro- and Nanostructures by Focused Ion Beam

Sun

Luo

2013

Lecture Notes in Nanoscale Science and Technology

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Focused ion beam (FIB) machining is an ideal technique for both micro-and nanofabrication. This chapter describes a deterministic fabrication approach to accurately obtain micro-and nanostructures. It starts with a detailed introduction of FIB machining mechanism, followed by a surface topography simulation method and a divergence compensation method. The effectiveness of this fabrication approach has been fully demonstrated through a number of experiments which show that the surface topography of the machined material can be precisely predicted; the divergence compensation method can reduce the machining error, and the machined surface form accuracy can be dramatically improved. Combining with other techniques, some hybrid manufacturing techniques based on FIB machining are also introduced.

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Section: Surface Topography Simulation In Fib Machiningmentioning

confidence: 99%

Deterministic Fabrication of Micro- and Nanostructures by Focused Ion Beam

Sun

Luo

2013

Lecture Notes in Nanoscale Science and Technology

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“…This is because at a fixed ion beam current and number of scan loops, an increase of the exposure time leading to the reduction of the scan speed, which results in an increase of the local beam incident angle [22], and thus a higher redeposition rate. The redeposition effect on features' cross-sections when milling fused silica coated with a thin Cr layer [23] and Si [24][25][26] was studied in details. Other factors, e.g., surface diffusion could also affect the surface morphology and profile evolution of the trenches.…”

Section: Profile Evolution (Amorphous Ni 78 B 14 Si 8 )mentioning

confidence: 99%

“…Other factors, e.g., surface diffusion could also affect the surface morphology and profile evolution of the trenches. By comparing the results, a conclusion can be made that the evolution of trench profiles is closely dependent on the feature size and geometry, substrate materials, scan speed, scan strategy and f i [21][22][23][24][25][26][27][28][29][30]. Fig.…”

Section: Profile Evolution (Amorphous Ni 78 B 14 Si 8 )mentioning

confidence: 99%

Patterning of amorphous and polycrystalline Ni78B14Si8 with a focused-ion-beam

Minev

Dimov

et al. 2007

Applied Surface Science

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“…The variation of the sputtering rate and the re-depositing effect on features' cross sections when milling Si was studied in details both experimentally and theoretically [19]. In particular, with the increase of aspect ratios the trenches in Si become narrower and their shape changes due to the re-depositing effect.…”

Section: Characterisation Of Trenches In Fused Silica Produced With Vmentioning

confidence: 99%