2014
DOI: 10.1134/s2070048214010141
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Simulation of RF plasma flowing at low pressure

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Cited by 14 publications
(7 citation statements)
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“…Different models of jet inductive coupled RF discharge at low pressure have been considered in our previous studies [12][13][14][15][16]. Direct Monte Carlo simulation (DSMC) [17] is used for simulation of carrier gas flow in these studies.…”
Section: Introductionmentioning
confidence: 99%
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“…Different models of jet inductive coupled RF discharge at low pressure have been considered in our previous studies [12][13][14][15][16]. Direct Monte Carlo simulation (DSMC) [17] is used for simulation of carrier gas flow in these studies.…”
Section: Introductionmentioning
confidence: 99%
“…Direct Monte Carlo simulation (DSMC) [17] is used for simulation of carrier gas flow in these studies. e dynamics of a carrier gas was considered in [12,13], taking into account the internal distributed heat source due to the transfer of energy from the electron gas. e pressure, the temperature, and the velocity of carrier gas both in the undisturbed flow and in the flow with a sample are calculated.…”
Section: Introductionmentioning
confidence: 99%
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“…Plasma is effectively used in the field of nanotechnology, for creating and modify in nanostructures (e.g., for the treatment of materials in order to improve durability and reliability of machinery, creating a light and strong polymer composites, polyethylene plastics, nanopowders of metals and their composites etc.) [1,2,22,23,28,29]. This paper is further work [27] where the model of interaction between CCRFD and a sample allowing to calculate characteristics of the discharge in an inter-electrode is given.…”
Section: Introductionmentioning
confidence: 99%