International Electron Devices Meeting. Technical Digest
DOI: 10.1109/iedm.1996.554053
|View full text |Cite
|
Sign up to set email alerts
|

Simultaneously formed storage node contact and metal contact cell (SSMC) for 1 Gb DRAM and beyond

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
5
0

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 7 publications
(5 citation statements)
references
References 0 publications
0
5
0
Order By: Relevance
“…Process variation is a well-known phenomenon that introduces deviations between a chip's intended design and its actual implementation [13,37,60]. DRAM cells are affected by process variation in two major aspects: (i) cell capacitance and (ii) cell resistance.…”
Section: Process Variation: Cells Are Not Created Equalmentioning
confidence: 99%
See 1 more Smart Citation
“…Process variation is a well-known phenomenon that introduces deviations between a chip's intended design and its actual implementation [13,37,60]. DRAM cells are affected by process variation in two major aspects: (i) cell capacitance and (ii) cell resistance.…”
Section: Process Variation: Cells Are Not Created Equalmentioning
confidence: 99%
“…First, due to process variation, some outlier cells suffer from a larger RC-delay than other cells, and require more time to be charged. For example, an outlier cell could have a very narrow connection (i.e., contact) to the bitline, which constricts the flow of charge and increases the RC-delay [37]. Second, due to temperature dependence, all cells suffer from a weaker charge-drive at high temperatures, and require more time to charge the bitline.…”
Section: Introductionmentioning
confidence: 99%
“…In practice, however, there is a very large margin in the timing parameters to ensure correct operation under worst-case conditions with respect to two aspects. First, due to process variation, some outlier cells su er from a larger RC-delay than other cells [64,94], and require more time to be accessed. Second, due to temperature dependence, DRAM cells lose more charge at high temperature [97,171], and therefore require more time to be accessed.…”
Section: Problem: High Dram Latencymentioning
confidence: 99%
“…In practice, however, there is a very large margin in the timing parameters to ensure correct operation under worst-case conditions with respect to two aspects. First, due to process variation, some outlier cells suffer from a larger RC-delay than other cells [46,67], and require more time to be accessed. Second, due to temperature dependence, DRAM cells lose more charge at high temperature [124], and therefore require more time to be sensed and restored.…”
Section: Summary 1problem: High Dram Latencymentioning
confidence: 99%