Here, the chemical oxygen surface exchange coefficient and film stress of porous La 0.6 Sr 0.4 FeO 3-δ (LSF64) thick films were simultaneously measured in situ between 275-375 • C and 275-700 • C, respectively, using a bilayer curvature measurement technique. The magnitude and activation energy of the porous LSF64 thick film oxygen surface exchange coefficients were consistent with those from large grained, bulk samples. However, unlike large-grained, dilatometry-tested bulk LSF64 samples that only exhibited measurable chemical stress above 525 • C, the fine-grained, curvature-tested porous LSF64 thick films studied here exhibited measurable chemical stress over the complete temperature range from 275 to 700 • C. Further, the porous LSF64 thick films exhibited a kink in their Arrhenius chemical stress behavior ( Oxygen-exchange-capable mixed ionic electronic conducting (MIEC) materials are widely used in electrochemical devices such as solid oxide fuel cells (SOFCs), 1-5 catalysts, 6,7 and gas separation membranes. 8,9 However, debate exists on the oxygen surface exchange rates of even the most-common MIEC materials. For instance, chemical oxygen surface exchange coefficient (k) discrepancies greater than 4 orders of magnitude are reported at identical temperature and oxygen partial pressure conditions for the MIEC material La 0.6 Sr 0.4 FeO 3-δ (LSF64). [10][11][12][13] Similarly, large k discrepancies have been observed for other MIEC materials such as lanthanum strontium cobalt iron oxide [14][15][16][17] and reduced cerium oxide. [18][19][20][21] Since recent studies have shown that strain can alter k, 20,21 it is likely that some of these observed k discrepancies are due to differences in MIEC stress state. Unfortunately, simultaneous k and stress state measurements on MIEC materials are largely absent from the literature. Here, the stress and oxygen surface exchange coefficients of porous LSF64 thick films atop single crystal (Y 2 O 3 ) 0.13 (ZrO 2 ) 0.87 (YSZ) substrates were simultaneously measured in situ using a new bilayer curvature measurement technique.
Theoretical BackgroundPorous thick film stress measurement.-Stresses in dense thin films (i.e. those with film to substrate thickness ratios less than 1:1000) can be rigorously extracted from bilayer curvature measurements using Stoney's Equation:whereλ St is the thickness averaged film stress predicted from Stoney's Equation, κ is the bilayer curvature, h s is the substrate thickness, h f is the film thickness, and M S is the substrate biaxial modulus defined as E S / (1 − υ S ) where E S is substrate Young's modulus and υ S is the substrate Poisson's Ratio. 22,23 Stoney's equation is convenient because the thickness averaged film stress (λ) (which is the same as the stress at each point in the film due to the film's thinness) can be extracted * Electrochemical Society Student Member.* * Electrochemical Society Active Member. z E-mail: jdn@msu.edu from bilayer curvature measurements without knowledge of the film elastic properties. In contrast, stre...