2016
DOI: 10.1016/j.dyepig.2016.04.044
|View full text |Cite
|
Sign up to set email alerts
|

Single crystal ruthenium(II) complex dye based photodiode

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
8
0

Year Published

2016
2016
2023
2023

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 50 publications
(8 citation statements)
references
References 42 publications
0
8
0
Order By: Relevance
“…Thus, the total electric field is stronger in this case than in the forward bias. When a diode is exposed to illuminations (= hc/qλ > E g ), many electron–hole pairs occur at the junction, and electrons may be recombined 4,23,24 . However, the recombination of the electron–hole pairs under the illumination effect decreases, so photocurrent increases in the reverse bias range because of the higher electric field value at the junction.It is well known that the conventional interfacial insulator layer such as SiO 2 formed on a semiconductor surface by the traditional methods (thermal or sputtering) cannot completely passivate the active dangling bonds at the semiconductor surface metal–insulator–semiconductor (MIS) type structures.…”
Section: Introductionmentioning
confidence: 99%
“…Thus, the total electric field is stronger in this case than in the forward bias. When a diode is exposed to illuminations (= hc/qλ > E g ), many electron–hole pairs occur at the junction, and electrons may be recombined 4,23,24 . However, the recombination of the electron–hole pairs under the illumination effect decreases, so photocurrent increases in the reverse bias range because of the higher electric field value at the junction.It is well known that the conventional interfacial insulator layer such as SiO 2 formed on a semiconductor surface by the traditional methods (thermal or sputtering) cannot completely passivate the active dangling bonds at the semiconductor surface metal–insulator–semiconductor (MIS) type structures.…”
Section: Introductionmentioning
confidence: 99%
“…6.b). The frequency characteristics for the C and G may be attributed to the presence of the interface states [47][48][49][50][51]. Because the interface states at low frequencies can follow the AC signal while they do not follow the AC signal at high frequencies [52].…”
Section: C-v and G/w-v Measurementsmentioning
confidence: 99%
“…Similarly, from Figure 9, the conductance remains constant with frequency at the positive voltage regime, however, in the negative regime, it increases while frequency increases. This observed behavior of conductance can also be attributed to the presence of the interface states series resistance [48]. The series resistance (R s ) of the fabricated photodiodes was investigated using the Nicollian and Goetzberger method [30], where;…”
Section: Transient Photocurrent Capacitance-voltage and Conductance-voltage Characteristics Of X % Ni-inzno (Nizo) Thin Filmmentioning
confidence: 99%