Single-shot ptychography at a soft X-ray free-electron laser

Kharitonov, Konstantin; Mehrjoo, Masoud; Ruiz-Lopez, Mabel; Keitel, Barbara; Kreis, Svea; Gang, Seung-gi; Pan, Rui; Marras, A.; Correa, Jonathan; Wunderer, C.; Plönjes, Elke

doi:10.1038/s41598-022-18605-x

Cited by 9 publications

(1 citation statement)

References 34 publications

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“…With large, high-peak-intensity flux, it is possible to transversely split the XFEL pulse (in this case a train of eight pulses lasting 300 nsec) and perform a single-shot extended ptychography measurement as a component of the full scan. This approach, recently demonstrated at an XFEL [89], would ease the development challenges for faster and more accurate scanning techniques as well as aid in the mitigation of potential radiation damage. It should be noted that improvements in mechanical and electronic hardware are already capable of improving the PyXFL imaging rate by decreasing imaging and processing overheads [90].…”

Section: Conclusion and Outlook For Chip Metrology Xfel Developmentmentioning

confidence: 99%

A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs

Rosenzweig,

Andonian,

Agustsson

et al. 2024

Instruments

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Recently, considerable work has been directed at the development of an ultracompact X-ray free-electron laser (UCXFEL) based on emerging techniques in high-field cryogenic acceleration, with attendant dramatic improvements in electron beam brightness and state-of-the-art concepts in beam dynamics, magnetic undulators, and X-ray optics. A full conceptual design of a 1 nm (1.24 keV) UCXFEL with a length and cost over an order of magnitude below current X-ray free-electron lasers (XFELs) has resulted from this effort. This instrument has been developed with an emphasis on permitting exploratory scientific research in a wide variety of fields in a university setting. Concurrently, compact FELs are being vigorously developed for use as instruments to enable next-generation chip manufacturing through use as a high-flux, few nm lithography source. This new role suggests consideration of XFELs to urgently address emerging demands in the semiconductor device sector, as identified by recent national need studies, for new radiation sources aimed at chip manufacturing. Indeed, it has been shown that one may use coherent X-rays to perform 10–20 nm class resolution surveys of macroscopic, cm scale structures such as chips, using ptychographic laminography techniques. As the XFEL is a very promising candidate for realizing such methods, we present here an analysis of the issues and likely solutions associated with extending the UCXFEL to harder X-rays (above 7 keV), much higher fluxes, and increased levels of coherence, as well as methods of applying such a source for ptychographic laminography to microelectronic device measurements. We discuss the development path to move the concept to rapid realization of a transformative XFEL-based application, outlining both FEL and metrology system challenges.

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Section: Conclusion and Outlook For Chip Metrology Xfel Developmentmentioning

confidence: 99%

A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs

Rosenzweig,

Andonian,

Agustsson

et al. 2024

Instruments

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In situ heating coherent X-ray diffraction imaging for visualizing nanometer-scale structural changes in metallic materials

Takazawa,

Sasaki,

Abe

et al. 2025

Materialia

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Data-driven discovery of dynamics from time-resolved coherent scattering

Andrejevic,

Zhou,

Zhang

et al. 2024

npj Comput Mater

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Coherent X-ray scattering (CXS) techniques are capable of interrogating dynamics of nano- to mesoscale materials systems at time scales spanning several orders of magnitude. However, obtaining accurate theoretical descriptions of complex dynamics is often limited by one or more factors—the ability to visualize dynamics in real space, computational cost of high-fidelity simulations, and effectiveness of approximate or phenomenological models. In this work, we develop a data-driven framework to uncover mechanistic models of dynamics directly from time-resolved CXS measurements without solving the phase reconstruction problem for the entire time series of diffraction patterns. Our approach uses neural differential equations to parameterize unknown real-space dynamics and implements a computational scattering forward model to relate real-space predictions to reciprocal-space observations. This method is shown to recover the dynamics of several computational model systems under various simulated conditions of measurement resolution and noise. Moreover, the trained model enables estimation of long-term dynamics well beyond the maximum observation time, which can be used to inform and refine experimental parameters in practice. Finally, we demonstrate an experimental proof-of-concept by applying our framework to recover the probe trajectory from a ptychographic scan. Our proposed framework bridges the wide existing gap between approximate models and complex data.

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Single-shot ptychography at a soft X-ray free-electron laser

Cited by 9 publications

References 34 publications

A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs

A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs

In situ heating coherent X-ray diffraction imaging for visualizing nanometer-scale structural changes in metallic materials

Data-driven discovery of dynamics from time-resolved coherent scattering

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