J. Electrochem. Soc.
 1992
DOI: 10.1149/1.2221224
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SiO2 Film Stress—Thickness Dependence, Non‐Planar Oxidation, and Fluorine‐Related Effects

Dimitrios N. Kouvatsos
1
,
Jiunn-Yuan Huang
2
,
V. Saikumar
3
et al.

Abstract: Siemens AG assisted in meeting the publication costs of this article. ibid., 592 (1988).

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