Site-Directed Molecular Assembly on Templates Structured with Electron-Beam Lithography

Musil, Christian R.; Wp, Ulrich; Leufgen, Kirsten; Padeste, Celestino; Dávid, Christian; Gobrecht, J.; Duschl, Claus; Vogel, Horst

doi:10.1021/la049954j

Cited by 15 publications

(15 citation statements)

References 24 publications

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“…Another independent determination of σ on an array of circles of 70 nm average diameter provided us with a consistent value of 3.2 nm. This indicates that the lineedge roughness is in the range of 4 nm, close to the 3.4 nm previously reported by Stamou et al for a similar patterning method of thiol SAMs on gold [7]. The value of ∼4 nm found for σ corresponds to a limiting feature size of about 15 nm, in the range of or below the size of most organic macromolecules in solution.…”

Section: Resultssupporting

confidence: 86%

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Nanopatterned self-assembled monolayers

Baralia

Pallandre²,

Nysten

et al. 2006

Nanotechnology

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We report on the fabrication of chemically nanopatterned gold surfaces by combining electron-beam lithography with gas and liquid phase thiolization. The line-edge roughness of the patterns is ∼4 nm, corresponding to a limiting feature size in the range of 15 nm. Indications for a lower packing density of the self-assembled monolayers grown in the nanofeatures are given, and evidences for the bleeding of thiols along the grain boundaries of the gold substrate are displayed. A comparison is provided between nanopatterned thiol and silane monolayers on gold and on silicon wafers, respectively. The line-edge roughnesses are shown to be close to each other for these two systems, indicating that the limiting step is currently the lithography step, suggesting possible improvement of the resolution. The advantages and drawbacks of thiol versus silane monolayers are finally discussed with respect to the formation of chemically nanopatterned surfaces. M Supplementary data files are available from stacks.iop.org/Nano/17/1160

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Section: Resultssupporting

confidence: 86%

“…replacing silanes with thiols [7]. Here, we extend this previous work to a wider range of thiols, and provide a comparison of the two patterning methods, silanes on silicon on the one hand, and thiols on gold surfaces on the other hand.…”

Section: Introductionmentioning

confidence: 82%

Nanopatterned self-assembled monolayers

Baralia

Pallandre²,

Nysten

et al. 2006

Nanotechnology

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“…A suitable tool for the synthesis of patterned structures is electron-beam lithography. [24][25][26] In a high vacuum, the accelerated electrons are focused on a substrate by lens systems. Nonsensitive hydrogel patterns based on poly(ethylene oxide) (PEO) on Si substrates were synthesized by using the focused electron beam (typically with diameter d % 10 nm) of a field-emission electron microscope.…”

Section: Introductionmentioning

confidence: 99%

“…Patterned hydrogels are typically applied in cell adhesion/detachment devices,15,16 automatically fluidic valves,17–20 micro‐reactors,21 sensors,22,23, etc. A suitable tool for the synthesis of patterned structures is electron‐beam lithography 24–26. In a high vacuum, the accelerated electrons are focused on a substrate by lens systems.…”

Section: Introductionmentioning

confidence: 99%

Temperature‐Sensitive Hydrogel Pattern by Electron‐Beam Lithography

Schmidt

Mönch

Arndt

2006

Macro Materials & Eng

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Summary: Cross‐linking of water‐soluble polymers by high‐energy irradiation provides a clean method for the synthesis of hydrogels. Some applications of stimuli‐sensitive polymers need different patterns in the micro‐ and submicrometer range on a supporting material. A dry layer of poly(vinyl methyl ether) on a Si‐wafer was cross‐linked and patterned by irradiation with the electron beam of a modified electron microscope. The patterns in the micro‐ and submicrometer range show good adhesion on the supporting material without adhesion promoter. The deformation and the elastic behavior of the pattern were tested by AFM. The formed gel structures were sensitive against changes in environmental condition. This offers a wide range of applications.

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“…In order to achieve high-density of ReRAM, the device needs to be fabricated at the nanoscale. Generally, lithographic techniques have been used to fabricate ordered nanostructures 9 10 11 , but these methods require a high production cost and a long processing time. Some non-conventional techniques have been introduced to overcome the problems.…”

mentioning

confidence: 99%

Self-assembled nanostructured resistive switching memory devices fabricated by templated bottom-up growth

Song

Lee

2016

Sci Rep

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Metal-oxide-based resistive switching memory device has been studied intensively due to its potential to satisfy the requirements of next-generation memory devices. Active research has been done on the materials and device structures of resistive switching memory devices that meet the requirements of high density, fast switching speed, and reliable data storage. In this study, resistive switching memory devices were fabricated with nano-template-assisted bottom up growth. The electrochemical deposition was adopted to achieve the bottom-up growth of nickel nanodot electrodes. Nickel oxide layer was formed by oxygen plasma treatment of nickel nanodots at low temperature. The structures of fabricated nanoscale memory devices were analyzed with scanning electron microscope and atomic force microscope (AFM). The electrical characteristics of the devices were directly measured using conductive AFM. This work demonstrates the fabrication of resistive switching memory devices using self-assembled nanoscale masks and nanomateirals growth from bottom-up electrochemical deposition.

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Site-Directed Molecular Assembly on Templates Structured with Electron-Beam Lithography

Cited by 15 publications

References 24 publications

Nanopatterned self-assembled monolayers

Nanopatterned self-assembled monolayers

Temperature‐Sensitive Hydrogel Pattern by Electron‐Beam Lithography

Self-assembled nanostructured resistive switching memory devices fabricated by templated bottom-up growth

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