2018
DOI: 10.1016/j.apsusc.2018.08.051
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Size-controlled growth of nanoparticles and clusters during pulsed laser ablation into an ambient wave induced plasma

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Cited by 3 publications
(1 citation statement)
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“…The ablated material is collected on a substrate upon which it condenses and forms a thin film with a deposition rate of 0.03-0.07 nm/pulse [24]. Reasonably, the PLD process can be divided into three steps [42,43]: 1 the generation of plasma, 2 expansion of plasma plume, 3 nucleation of vapor and film growth.…”
Section: Pulsed Laser Depositionmentioning
confidence: 99%
“…The ablated material is collected on a substrate upon which it condenses and forms a thin film with a deposition rate of 0.03-0.07 nm/pulse [24]. Reasonably, the PLD process can be divided into three steps [42,43]: 1 the generation of plasma, 2 expansion of plasma plume, 3 nucleation of vapor and film growth.…”
Section: Pulsed Laser Depositionmentioning
confidence: 99%