Small catadioptric microscope optics

Shafer, David; Chuang, Yung-Ho; Armstrong, J. J.

doi:10.1117/12.561002

Cited by 6 publications

(2 citation statements)

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“…in Ref. [17][18][19]. Only a few years ago, immersion optics was out of discussion in the semiconductor industry for a variety of reasons, in particular because of the fear of contaminating masks and wafers by residual impurities in the immersion fluid.…”

Section: X/125 Duv-at Water Immersion Objectivesmentioning

confidence: 99%

Ultra-high-performance microscope objectives: the state of the art in design, manufacturing, and testing

et al. 2007

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During the last years, new microscope applications require an increased resolution which enforces the development of new state of the art high NA immersion objectives. With the introduction of the 4Pi confocal fluorescence microscope, the increase of the numerical aperture from NA=1.4 to NA=1.46 makes sense, although the gain of lateral resolution is quite small. On the other hand, for inspection and metrology in the semiconductor industry the continuously decreasing structures need the highest possible resolution, which can be achieved with high NA water immersion objectives working in the DUV wavelength range. Building this kind of objectives requires special measuring and testing technologies and a manufacturing precision which has never been realized before in series production.

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Section: X/125 Duv-at Water Immersion Objectivesmentioning

confidence: 99%

Ultra-high-performance microscope objectives: the state of the art in design, manufacturing, and testing

et al. 2007

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“…Even with the use of anomalous dispersion glasses, it is still difficult for most designs to get excellent correction over a broad spectrum. Figure 15 shows an unusual catadioptric microscope objective [ 13 ], which is 0.90 NA and is diffraction-limited over a small field over an enormous spectral range -from the deep UV through the near IR -and, yet, only uses one glass type in the design. The key to this broad spectral correction is the use of an Offner field lens at an intermediate image.…”

Section: Extreme Wavelength Rangementioning

confidence: 99%

Lens designs with extreme image quality features

Shafer¹

2013

Advanced Optical Technologies

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Abstract:In order to best assess the importance of new technologies to optical design, it is useful to consider what the limits are to what can be done with ' old ' technologies. That may show where something new is needed to overcome the limitations of existing optical designs. This article will give a survey of some remarkable highperformance designs, some of which are extremely simple, and most of which only use technology that has already been around for decades. Each of these designs has some limitation that would be nice to overcome. One new technology that will probably revolutionize optical design will be curved surfaces on image chips.

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