Soft X-ray Source by Laser Produced Xe Plasma

Amano, Sho; Masuda, Kazuya; Miyamoto, Shuji; Mochizuki, Takayasu

doi:10.1541/ieejeiss.130.1768

Cited by 2 publications

(3 citation statements)

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“…The spatial intensity distribution pattern had a sharp peak with a full width at half maximum of 1.8 mm within a circle with a diameter of 24 mm [3].…”

Section: Continuous Soft X-ray Irradiation Systemmentioning

confidence: 99%

“…The soft X‐ray intensity at the condensing point was 1.3 mJ/cm 2 (1 mm diameter) for a laser energy of 0.3 Jm based on the results of measurement. The spatial intensity distribution pattern had a sharp peak with a full width at half maximum of 1.8 mm within a circle with a diameter of 24 mm .…”

Section: Continuous Soft X‐ray Irradiation Systemmentioning

confidence: 99%

“…During research and development, our selected target material was xenon (Xe), which produces plasma emission in the 13.5 nm@2% band required for the objective of an EUVL source . However, the newly developed Xe plasma soft X‐ray source has a high efficiency of 30% at 5 nm to 17 nm and reaches a high output of 20 W , so that it is likely to be effective for uses other than the 13.5 nm EUVL. Thus, in order to investigate the possibility of using this source as a replacement for the EUVL NewSUBARU source in micromachining research, we began applied research on micromachining and surface modification using laser plasma soft X‐rays at 5 nm to 17 nm.…”

Section: Introductionmentioning

confidence: 99%

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Micromachining Using Soft X‐Rays from Laser‐Produced Xe Plasma

Amano

Inoue

Miyamoto

2016

Elect Comm in Japan

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SUMMARY Micromachining of poly(tetrafluoroethylene) (Teflon) and poly(methyl methacrylate) (PMMA) samples was carried out using soft X‐rays from a laser‐produced Xe plasma source, which we developed. In the Teflon sample, the contact angle with a water droplet on a modified surface increased from 90° to 110° as a result of irradiation without a mirror or mask, while the angle decreased to 50° when using irradiation with them. Scanning electron microscopy showed numerous micro‐protuberances and a masked pattern with micro‐concavities on each sample surface. These results suggested that a change to the contact angle was caused by the microstructures on the Teflon surface. We succeeded in controlling the wettability of the Teflon surface, from hydrophobic to hydrophilic, by micromachining using laser plasma X‐rays. In the PMMA sample, the etching rate was investigated with irradiation using a large number of pulses (192,000 pulses) and a low power density of 8 × 104 W/cm2. The etching rate was calculated to be 5 pm/pulse. This was judged to be due only to photo‐etching without any thermal effects. We demonstrated a pure photo‐etching depth of about 1 μm.

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“…The spatial intensity distribution pattern had a sharp peak with a full width at half maximum of 1.8 mm within a circle with a diameter of 24 mm [3].…”

Section: Continuous Soft X-ray Irradiation Systemmentioning

confidence: 99%

Section: Continuous Soft X‐ray Irradiation Systemmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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