“…Ferroelectric thin films have been successfully deposited by rf sputtering [17][18][19], metal organic chemical vapor deposition [17], sol gel [8,9,12,17] and pulsed laser deposition (PLD) [7,17,[20][21][22][23][24]. Among these processes the PLD technique is superior since it possesses the advantages viz., lower synthesis temperature, easy to control the stoichiometry of thin films, possibility of depositing oxides of high melting point and materials of metastable phase [17].…”