“…1. Effective diffusion coefficients of copper in silicon calculated for different boron doping levels (lines) and experimental data obtained by our group [38] (circles, N a 1.5 Â 10 14 cm ± ±3 and diamonds, N a 2 Â 10 15 cm ± ±3 ), by Struthers [25] (open triangle), and by Hall and Racette [26] (triangles, N a 5 Â 10 20 cm ± ±3 ). (1) Intrinsic silicon, (2) N a 1.5 Â 10 14 , (3) 2 Â 10 15 , (4) 1 Â 10 17 , (5) 5 Â 10 20 cm ± ±3 room temperature, and a significant potential barrier is required to suppress precipitation of highly mobile copper.…”