2018
DOI: 10.1021/acsami.8b14887
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Solution-Based Property Tuning of Black Phosphorus

Abstract: The air instability of black phosphorus (BP) severely hinders the development of its electronic and optoelectronic applications. Although a lot of effort has been made to passivate it against degradation in ambient conditions, approaches to further manipulate the properties of passivated BP are still very limited. Herein, we report a simple and low-cost chemical method that can achieve BP passivation and property tailoring simultaneously. The method is conducted by immersing a BP sample in the solution contain… Show more

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Cited by 16 publications
(17 citation statements)
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“…As illustrated in Figure 3d,e, the contact resistance after NMP doping decreased from 87 to 21.2 kΩ µm at V GS = 30 V, equivalent to four times. The values of contact resistance before and after doping were overall greater than those of previous literature,4,8,39 which may be attributed to wider electrode contact and no use of low work function metals such as titanium (Ti) to reduce Schottky barrier height and to facilitate electron injection 40,41. Contact resistances before and after doping as a function of V GS are displayed in Figure 3f.…”
Section: Charge Density and Carrier Mobility Before And After Dopingmentioning
confidence: 84%
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“…As illustrated in Figure 3d,e, the contact resistance after NMP doping decreased from 87 to 21.2 kΩ µm at V GS = 30 V, equivalent to four times. The values of contact resistance before and after doping were overall greater than those of previous literature,4,8,39 which may be attributed to wider electrode contact and no use of low work function metals such as titanium (Ti) to reduce Schottky barrier height and to facilitate electron injection 40,41. Contact resistances before and after doping as a function of V GS are displayed in Figure 3f.…”
Section: Charge Density and Carrier Mobility Before And After Dopingmentioning
confidence: 84%
“…Contact resistance before doping showed strong gate modulation behavior, which decreased as gate voltage increased and remained almost unchanged after doping. Sweeping from low to high gate voltage before doping, the reduced contact resistance was caused by the enhanced electron concentration in MoS 2 under metal contact due to enhanced electrostatic field 8. By contrast, the electron concentration of heavily doped MoS 2 did not change significantly with the electrostatic field.…”
Section: Charge Density and Carrier Mobility Before And After Dopingmentioning
confidence: 98%
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