2018
DOI: 10.3390/electronics7120445
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Solution-Processable ZnO Thin Film Memristive Device for Resistive Random Access Memory Application

Abstract: The memristive device is a fourth fundamental circuit element with inherent memory, nonlinearity, and passivity properties. Herein, we report on a cost-effective and rapidly produced ZnO thin film memristive device using the doctor blade method. The active layer of the developed device (ZnO) was composed of compact microrods. Furthermore, ZnO microrods were well spread horizontally and covered the entire surface of the fluorine-doped tin oxide substrate. X-ray diffraction (XRD) results confirmed that the synth… Show more

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Cited by 45 publications
(21 citation statements)
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“…Considered as a fourth fundamental circuit element along with resistor, capacitor, and an inductor 32 , the memristive devices are better known for their memory with resistance property. The memristive devices basically depend on two important recognition criteria such as hysteresis loop in I-V plane and frequency-dependent I-V hysteresis loop or limiting linear characteristic [33][34][35] . As per the theory of limiting linear characteristics, the I-V hysteresis loop shrinks as the frequency of applied signal increases.…”
mentioning
confidence: 99%
“…Considered as a fourth fundamental circuit element along with resistor, capacitor, and an inductor 32 , the memristive devices are better known for their memory with resistance property. The memristive devices basically depend on two important recognition criteria such as hysteresis loop in I-V plane and frequency-dependent I-V hysteresis loop or limiting linear characteristic [33][34][35] . As per the theory of limiting linear characteristics, the I-V hysteresis loop shrinks as the frequency of applied signal increases.…”
mentioning
confidence: 99%
“…Therefore, the devices exhibited an ohmic transport mechanism at the LRS, as shown in step 4 in Figure 11 . When applying a negative bias to the top Ag electrode, the Ag filaments were oxidized into Ag + ions and then reduced at the Ag electrode, leading to the rupture of the filament conduction path corresponding to the switching of these devices from a LRS to a HRS [ 33 ], as depicted the step 5 in Figure 11 .…”
Section: Resultsmentioning
confidence: 99%
“…ZnO是一种常见的二元过渡金属氧化物半导体材 料 [14] , 具有优异的光学和电学性能, 不仅广泛应用于 半导体薄膜晶体管 [15] 、发光二极管 [16] 、光催化 [17] 和钙 钛矿太阳能电池 [18,19] 等多个研究领域, 而且在RRAM领 域也颇具应用潜力 [20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35] . 制备ZnO薄膜常见方法主要有 磁控溅射法(Magnetron Sputtering) [20][21][22][23][24][25] 、原子层沉积法 (ALD) [26][27][28] 、脉冲激光沉积法(PLD) [29][30][31] 以及溶液法 (Solution Method) [32][33][34][35]…”
Section: 高的Rram回归研究者视野 2000年 Prunclassified