2022
DOI: 10.1021/acsapm.1c01752
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Solvent Polarity-Modulated Molecular Alignment of Linear Diacetylenic Acid Films by Solution Shearing

Abstract: Directional alignment of functional molecules has important implications in various areas. Here, films of well-aligned linear diacetylenic acid, 10,12-pentacosadiynoic acid, were prepared by the solution-shearing method and photopolymerized to give well-aligned poly­(ene-yne) films. Depending on the polarity of the solvent used in the shearing process, the direction of molecular alignment and the resultant polymer chains varied as a function of the polarity of the solvent used so that they oriented mainly para… Show more

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Cited by 3 publications
(12 citation statements)
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“…According to a previous report, shearing of the linear C 12 DAC 8 COOH molecules from hexane solution yielded thin films with the diacetylene units tilted along the shearing direction and so was the poly(eneyne) backbone upon polymerization. 21 In the current work, 2 mg/mL acids in hexane were coated onto the phenyltrichlorosilane (PTS)-modified SiO 2 /Si substrates at the speed of 0.50−0.05 mm/s and at a surface temperature of 33−38 °C using the solution-shearing method. The same films were prepared on PTS-modified quartz substrates for the UV absorption measurement.…”
Section: Resultsmentioning
confidence: 99%
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“…According to a previous report, shearing of the linear C 12 DAC 8 COOH molecules from hexane solution yielded thin films with the diacetylene units tilted along the shearing direction and so was the poly(eneyne) backbone upon polymerization. 21 In the current work, 2 mg/mL acids in hexane were coated onto the phenyltrichlorosilane (PTS)-modified SiO 2 /Si substrates at the speed of 0.50−0.05 mm/s and at a surface temperature of 33−38 °C using the solution-shearing method. The same films were prepared on PTS-modified quartz substrates for the UV absorption measurement.…”
Section: Resultsmentioning
confidence: 99%
“…The silicon wafers with a 300 nm SiO 2 surface layer were cleaned by Piranha solution and rinsed thoroughly with pure water, IPA, and acetone in sequence. The cleaned silicon wafers were soaked in 1% solution of phenyltrichlorosilane (PTS) in dry toluene for 1 h to give the PTS-modified SiO 2 /Si substrate . Shearing was carried out on a custom-made blade coater.…”
Section: Methodsmentioning
confidence: 99%
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“…1(a)), where m and n represent the spacer group and the terminal alkyl chain around the DA units, respectively. We showed that the columnar packing of HBC cores can help align the DA-containing side chains along the column and get polymerized [26][27][28][29][30] to give conjugated poly(eneyne) chains as conducting channels for transistor application. The position of the DA unit along the alkyl chain nevertheless appeared to affect the polymerization profoundly.…”
Section: Introductionmentioning
confidence: 99%