1975
DOI: 10.1002/pssa.2210290114
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Some effects of annealing and non-stoichiometry on the structure of epitaxial films of CdTe on Ge

Abstract: Films of sphalerite structure CdTe grown on (100) faces of Ge were annealed in vacuum for 6 to 9 h at 400 °C. This greatly reduced the number of planar defects in the films and eliminated the streaks from their diffraction patterns. Similar annealing of the (0001) wurtzite‐structure films of CdTe grown on (111) surfaces of Ge had no effect on the structure of the CdTe films. Moire fringes with a 15 Å spacing were seen in transmission electron micrographs of as‐grown CdTe (111) Ge heterojunctions in regions in … Show more

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Cited by 6 publications
(2 citation statements)
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“…The level of perfection of these films is similar to that of the other II-VI compound films (Abdalla et al, 1973;Holt and Abdalla, 1974;Holt and Woodcock, 1970). It is also similar to the best levels reported for other heteroepitaxial films.…”
Section: Introductionsupporting
confidence: 86%
“…The level of perfection of these films is similar to that of the other II-VI compound films (Abdalla et al, 1973;Holt and Abdalla, 1974;Holt and Woodcock, 1970). It is also similar to the best levels reported for other heteroepitaxial films.…”
Section: Introductionsupporting
confidence: 86%
“…6b) directions. Basing on such interpretation of satellite spots in diffraction patterns, Holt and coworkers investigated a wide number of II-VI thin epitaxial layers obtained on various substrates at wide range of substrate temperatures ( [33][34][35][36][37][38] see also review paper [10] and references therein). Palatnik [39,40] investigated nanocrystal layers consisting of CdTe particles grown on NaCl and KBr substrates.…”
Section: Twinning In Thin Layer Of Zinc-blende Chalcogenidesmentioning
confidence: 99%