2022 IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON) 2022
DOI: 10.1109/edkcon56221.2022.10032826
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Source Extended GaSb/GaAs Heterojunction GAATFET to Improve ION/IOFF Ratio

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Cited by 3 publications
(1 citation statement)
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“…Few researchers have already found some solutions to overcome the ambipolarity in TFETs, which include placing a dielectric pocket at drain/channel interface, 12 elevated source TFET, 13 using electrostatic doping, etc 14 . Moreover, a few techniques like gate‐all‐around TFET, 15 source with low bandgap material, 16 hetero dielectric, 17 strain engineering, 18 heterojunction 19 etc. have been suggested in the literature by a few research groups to amplify the on‐state conduction in TFETs.…”
Section: Introductionmentioning
confidence: 99%
“…Few researchers have already found some solutions to overcome the ambipolarity in TFETs, which include placing a dielectric pocket at drain/channel interface, 12 elevated source TFET, 13 using electrostatic doping, etc 14 . Moreover, a few techniques like gate‐all‐around TFET, 15 source with low bandgap material, 16 hetero dielectric, 17 strain engineering, 18 heterojunction 19 etc. have been suggested in the literature by a few research groups to amplify the on‐state conduction in TFETs.…”
Section: Introductionmentioning
confidence: 99%