1987
DOI: 10.1116/1.574834
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Spatial mapping of electrically active defects in HgCdTe using laser beam-induced current

Abstract: A high-resolution and nondestructive optical characterization technique called laser beam-induced current (LBIC) has been developed and utilized to obtain maps of electrically active defects in liquid phase epitaxy HgCdTe. The LBIC technique is also suitable for studying the p–n junction detector elements in an array nondestructively, without requiring any electrical contacts to individual detector elements.

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Cited by 59 publications
(20 citation statements)
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“…LBIC has proven useful in providing spatially resolved information about electrically active defects and localized nonuniformities in HgCdTe materials and devices used for infrared photovoltaic arrays. [7][8][9] In LBIC, regions of the semiconductor material which contain built-in fields will separate electron-hole pairs generated by an incident low power focused laser beam providing a measurable current. By scanning the laser across the sample, a map of the induced current is obtained which is indicative of the localized electric field distributions in the semiconductor.…”
Section: Introductionmentioning
confidence: 99%
“…LBIC has proven useful in providing spatially resolved information about electrically active defects and localized nonuniformities in HgCdTe materials and devices used for infrared photovoltaic arrays. [7][8][9] In LBIC, regions of the semiconductor material which contain built-in fields will separate electron-hole pairs generated by an incident low power focused laser beam providing a measurable current. By scanning the laser across the sample, a map of the induced current is obtained which is indicative of the localized electric field distributions in the semiconductor.…”
Section: Introductionmentioning
confidence: 99%
“…The n-on-p photodiodes were fabricated by the ion-milling technique. [4][5][6][7][8][9][10] The thickness of the epilayer was approximately 25 µm and the surface was passivated with a thin ZnS layer (0.25 µm thick) after surface processing with mechanical polishing and chemical etching with Br 2 /methanol. For the diodes fabrication, the type-conversion regions were designed by photolithography, followed by Ar + ion-bombardment to form the n-on-p junctions.…”
Section: Methodsmentioning
confidence: 99%
“…The short broken, solid, and long broken lines are the vertical profiles of the relative OBIC intensity before aging, the relative OBIC intensity after aging, and the relative OBIC intensity difference before and after aging, respectively (Modified from Takeshita et al [39]) n-type InP buried layer and the n-type InP substrate are isolated by the p-type InP buried layer, and the electrons generated in depletion layers (3) and (4) do not reach the n-type InP substrate. On the other hand, an additional OBIC generated around depletion layers (3) and (4) is obtained after aging. This means that an electrical connection is realized between the n-type InP buried layer and the n-type InP substrate after aging.…”
Section: Inp Layer Degradationmentioning
confidence: 99%