2018
DOI: 10.1364/oe.26.010616
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Spatial resolution versus contrast trade-off enhancement in high-resolution surface plasmon resonance imaging (SPRI) by metal surface nanostructure design

Abstract: Surface plasmon resonance imaging (SPRI) is an optical near-field method used for mapping the spatial distribution of chemical/physical perturbations above a metal surface without exogenous labeling. Currently, the majority of SPRI systems are used in microarray biosensing, requiring only modest spatial resolution. There is increasing interest in applying SPRI for label-free near-field imaging of biological cells to study cell/surface interactions. However, the required resolution (sub-µm) greatly exceeds what… Show more

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Cited by 12 publications
(6 citation statements)
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“…Cells imaged on the structured film (B) are better resolved than on the unstructured film (A), while maintaining a high image contrast as shown in (C). In a previous work (Banville et al, 2018), we showed by numerical modeling and confirmed experimentally that the attenuation length for a 50 nm unstructured Au film is ~11 µm and ~1.7 µm for the proposed nanostructured film. This reduction in attenuation length improves the spatial resolution, which results in gaps between cells and cell edges being more defined on the nanostructured sensor chip, the plasmonic mode allowing to isolate the structural parts in the immediate vicinity (~100 nm) of the surface.…”
Section: Sensor Chip Designsupporting
confidence: 70%
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“…Cells imaged on the structured film (B) are better resolved than on the unstructured film (A), while maintaining a high image contrast as shown in (C). In a previous work (Banville et al, 2018), we showed by numerical modeling and confirmed experimentally that the attenuation length for a 50 nm unstructured Au film is ~11 µm and ~1.7 µm for the proposed nanostructured film. This reduction in attenuation length improves the spatial resolution, which results in gaps between cells and cell edges being more defined on the nanostructured sensor chip, the plasmonic mode allowing to isolate the structural parts in the immediate vicinity (~100 nm) of the surface.…”
Section: Sensor Chip Designsupporting
confidence: 70%
“…The sensor chip metal surface nanostructure geometry (Fig. 1B) was designed numerically as explained elsewhere (Banville et al, 2018) to achieve the optimal compromise between spatial resolution limited by the mode attenuation length, image contrast and sensitivity. The chips are composed of a BK7 glass cover slip (170 μm thick, 22×22 mm, Fisher Scientific), a 3 nm Cr adhesion layer, a 25 nm continuous Au film (h1), 25 nm thick (h2) square Au nanostructures (width w of 200 nm, grating period Λ of 400 nm).…”
Section: Sensor Chip Designmentioning
confidence: 99%
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“…For example, gold layer with thickness of 313nm can be deposited on glass substrate by sputtering. Then the traditional photolithography technology is used to make the gold grating graphics [35]- [37].…”
Section: Structure and Methodsmentioning
confidence: 99%
“…These devices have gained wide attention and experienced considerable development because they have small dimensions, fast operating speed, and low energy consumption. In particular, lensing and focusing components are widely used in many technologies, such as high-resolution imaging [66,67,68,69,70], nanolithography [71,72,73,74,75], and optical integration [76,77,78,79]. However, due to the diffraction limit which means the resolvable feature size is determined by d=λ2NA (where d is the resolvable feature size, λ is the wavelength of incident light, and NA is the numerical aperture) due to the wave nature of radiation, the imaging resolution of conventional lenses and optical systems is difficult to break through the dimension of half of the incident wavelength.…”
Section: Introductionmentioning
confidence: 99%