We carry out Si doping in InAs/GaAs quantum dots (QDs) by selecting appropriate steps of the self-assembling growth process. The self-assembling growth process of QDs consists of nucleation, assembling, self-limiting, and dissolving steps. The electrical conductivity of the QDs doped at the various growth steps has been investigated by conductive atomic force microscopy. The two-dimensional current images demonstrate that the spatial carrier distribution remarkably depends on the growth steps. When Si impurities are introduced into QDs during the assembling step, carriers are preferentially incorporated in the QDs. Furthermore, the doped QDs lead to enhancement of the photoluminescence intensity and to suppression of the temperature quenching of the intensity.