The reactions of H atoms and OH radicals with fullerene
C60 were studied behind reflected shock waves
by
time-dependent absorption measurements. Shock-heated mixtures of
C2H5I highly diluted in argon were
used as a source for H atoms, and their absorption at λ = 121.6 nm
was monitored using the highly sensitive
ARAS technique. In a second series of experiments OH radicals were
generated in H2/N2O/Ar reaction
systems, and the absorption of OH was monitored at ν = 32 403.41
cm-1 using ring dye laser
absorption
spectroscopy (RDLAS). In each case, the respective mixtures were
perturbed by C60. Simultaneously with
the absorption measurements, emission spectroscopy with an intensified
CCD camera was used to acquire
additional information about the reaction systems. The H atom
experiments were performed at temperatures
between 2100 and 2300 K, while OH absorption was measured in the
temperature range 2020 K ≤ T ≤ 2540
K. Postshock pressures were around 1.30 bar for all experiments.
From the H-absorption measurements, an
upper limit for the reaction C60 + H to products (R9)
(k
9 < 1.0 × 1012 cm3
mol-1 s-1) was determined.
For
the H2/N2O/Ar + C60 reaction
system, different kinetic models were discussed to verify the measured
OH
absorption. The reaction C60 + OH to products (R7)
(k
7 = 1.0 × 1015
exp(−6030 K/T) cm3 mol-1
s-1) with
the given rate coefficient represents the experimental findings quite
well.