2012
DOI: 10.1016/j.matchemphys.2012.07.049
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Spectroscopic evidence of NOx formation and band-gap narrowing in N-doped TiO2 films grown by pulsed magnetron sputtering

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Cited by 18 publications
(16 citation statements)
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“…Otherwise, the TiO 2 :N layers are also amorphous after heating but with a low refractive index that is more according to an "anatase-like" shortrange arrangement. A nitrogen-induced transformation from rutile-like to anatase-like structures has been reported for other films that were X-ray amorphous as-grown on unheated substrates [21]. Here, analogous behavior has been observed in the asgrown samples and it becomes more pronounced after heating, when anatase vibrational modes can be found in the TiO 2 :N layer (Fig.…”
Section: Resultssupporting
confidence: 78%
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“…Otherwise, the TiO 2 :N layers are also amorphous after heating but with a low refractive index that is more according to an "anatase-like" shortrange arrangement. A nitrogen-induced transformation from rutile-like to anatase-like structures has been reported for other films that were X-ray amorphous as-grown on unheated substrates [21]. Here, analogous behavior has been observed in the asgrown samples and it becomes more pronounced after heating, when anatase vibrational modes can be found in the TiO 2 :N layer (Fig.…”
Section: Resultssupporting
confidence: 78%
“…In accordance with such statement, all the layers prepared with N 2 in the sputtering atmosphere have been found amorphous for the various oxygen proportions tested. In this sense, it has been reported that N incorporation induces some amorphization of the rutile structure conferring an anatase-like character [21]. This is Fig.…”
Section: Resultsmentioning
confidence: 83%
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“…The dominant A 101 reflection from the TiO 2 :N coating evidences that the addition of N under these conditions prevents rutile formation and yields a nearly single-phase anatase film. This effect was reported in detail in a previous publication by some of the present authors [20] and other groups [27][28][29]. In the Cr co-doped monolithic film, the structure displays a strong mixed-phase character where the rutile content is significantly higher than in the pure TiO 2 film.…”
Section: Sample Characterizationsupporting
confidence: 80%
“…In the latter case, a buffer TiO 2 :N films was initially grown (W Cr = 0 W) with a thickness up to several tens of nm's followed by the subsequent instant (bilayer coating) or gradual (gradient coating) increase in W Cr to produce the Cr-containing layer(s). The deposition was done at a substrate temperature, T s , of 300 • C to achieve high-quality anatase phase in TiO 2 :N films [20].…”
Section: Sample Preparationmentioning
confidence: 99%