Emerging Non-Volatile Memory Technologies 2021
DOI: 10.1007/978-981-15-6912-8_2
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Spin Transfer Torque Magnetoresistive Random Access Memory

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Cited by 4 publications
(2 citation statements)
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“…Strontium Ruthenate (SrRuO 3 ) bottom electrode and a ferroelectric barrier with a thickness of 3.6 nm were used in 2010 to produce the enormous Tunneling Electro resistance (TER) phenomenon in FTJs. Retention was shown by the TER effect to last 72 h (Law and Wong, 2021b;Dörfler et al, 2020). Cobalt and Gold electrode FTJ in 2012 had a TER ratio of 64 and withstood 900 ON/OFF cycles.…”
Section: Figurementioning
confidence: 99%
“…Strontium Ruthenate (SrRuO 3 ) bottom electrode and a ferroelectric barrier with a thickness of 3.6 nm were used in 2010 to produce the enormous Tunneling Electro resistance (TER) phenomenon in FTJs. Retention was shown by the TER effect to last 72 h (Law and Wong, 2021b;Dörfler et al, 2020). Cobalt and Gold electrode FTJ in 2012 had a TER ratio of 64 and withstood 900 ON/OFF cycles.…”
Section: Figurementioning
confidence: 99%
“…is at the heart of MRAM technology [3,4], and has proven particularly effective in tunnel magnetoresistive devices and circuits [5,6]. Spin transfer torque (STT)-MRAM devices with a CoFeB/MgO/CoFeB heterostructure provide high thermal stability and a low damping constant [7].…”
Section: Introductionmentioning
confidence: 99%