“…The bias voltage, V b , applied between an Al Schottky contact on top of the n-doped layer and the p-doped substrate, generates the vertical electric field E z required for the control of the SO-interaction. From previous measurements in a similar sample, we expect to reach E c z at a reverse voltage bias V b ≈ −1.5 V. 15,19 To confine the electric field along the z-direction, we processed the top doped layer and part of the top undoped (Al,Ga)As spacer into mesa structures of 300 µm diameter defined by wet chemical etching.…”