Sputter deposition of NiTi to investigate the Ti loss rate as a function of composition from cast melted targets

Rumpf, Holger; Winzek, Bernhard; Zamponi, Christiane; Siegert, W.; Neuking, K.; Quandt, Eckhard

doi:10.1016/j.msea.2003.11.063

Cited by 20 publications

(15 citation statements)

References 8 publications

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“…The composition of all films was determined as about Ni 50.1 Ti 49.9 (±0.1 at %). Comparing target and thin film compositions, we note a loss of Ti during deposition, which is a well-known effect [20].…”

Section: Methodsmentioning

confidence: 66%

Growth, microstructure and thermal transformation behaviour of epitaxial Ni-Ti films

et al. 2017

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Epitaxial films have the potential to be used as model systems for fundamental investigations on the martensitic transformation in binary NiTi. In this paper, we discuss growth of binary NiTi thin films on single crystalline MgO substrates. Sputter deposition is used to grow NiTi films. Films prepared by complementary preparation routes (with different deposition temperatures and subsequent heat treatments) are investigated by X-ray diffraction, electron microscopy, atomic force microscopy, and electrical resistivity measurements, with the aim of optimizing film properties, particularly to obtain a well defined orientation of the austenitic unit cell and smooth surfaces. Our results show that deposition at elevated temperatures and carefully controlled subsequent heat treatments allow to produce epitaxially grown and smooth NiTi films that exhibit reversible one-or two-step martensitic transformations.

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Section: Methodsmentioning

confidence: 66%

Growth, microstructure and thermal transformation behaviour of epitaxial Ni-Ti films

et al. 2017

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“…10,13) Thin films of NiTi were deposited at 450 C in the crystalline state on silicon substrates using a vonArdenne CS730 sputtering cluster machine at a typical deposition rate of 13 mm/h. The base vacuum was about 1 Â 10 À5 Pa. Due to the different angular sputtering distributions for nickel and titanium the film composition deviates from the composition of the target.…”

Section: Methodsmentioning

confidence: 99%

“…In correspondence with analysis results published in our previous work, for the employed sputtering geometry a typical loss rate of 4-4.5 at% Ti between cast-melted target and sputter deposited film was found. 10) Consequently, the target composition was chosen to be Ti-53.5 at%Ni-46.5 at% in order to obtain a composition of Ti-49 at%Ni-51 at% in the films. Care has been taken to minimize oxygen contamination during the cast-melting process for target preparation as well as for the sputtering system.…”

Section: Methodsmentioning

confidence: 99%

“…for neurovascular applications, bulk machining is envisioned to be replaced by thin film technology. Sputtering and sacrificial layer technology have been proven to be suitable methods for the fabrication of freestanding thin films revealing a film thickness between 5 and 50 mm [4][5][6][7][8][9][10][11] and a superelastic strain up to 6.5% in tensile testing experiments. 12) Within this work, the realization of structured planar NiTi films is described and first net-shaped test structures were fabricated which seem to be potential candidates for e.g.…”

Section: Introductionmentioning

confidence: 99%

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Near Net-Shape Fabrication of Superelastic NiTi Devices by Sputtering and Photoetching

et al. 2006

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NiTi-films were fabricated by DC magnetron sputtering from cast-melted disc targets. The obtained freestanding films revealed superelastic properties in tensile testing experiments. At 37 C superelastic properties were achieved showing a closed-loop hysteresis and a plateau of more than 5% strain. Photolithography and wet etching technology were applied in order to fabricate net-shaped devices. Achievable structure sizes range in the order of the NiTi film thickness, i.e. typically between 5 and 15 mm. Tensile testing experiments reveal a remarkable strain tolerance of these devices which summed up to a superelastic strain of up to 5%. It has been demonstrated that the deposition process can be transferred to the fabrication of NiTi tubes, which have high potential for application as vascular implants, e.g. stents.

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“…They can be evaluated by, for example, the cantilever method [9] or differential scanning calorimetry (DSC) [10]. However, DSC has a low throughput, as it measures a single sample of a thick freestanding film at a time, and is not suitable for thin films with a low hysteresis [11].…”

Section: Introductionmentioning

confidence: 99%

Modular high-throughput test stand for versatile screening of thin-film materials libraries

Thienhaus¹,

Hamann²,

Ludwig³

2011

Science and Technology of Advanced Materials

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Versatile high-throughput characterization tools are required for the development of new materials using combinatorial techniques. Here, we describe a modular, high-throughput test stand for the screening of thin-film materials libraries, which can carry out automated electrical, magnetic and magnetoresistance measurements in the temperature range of −40 to 300• C. As a proof of concept, we measured the temperature-dependent resistance of Fe-Pd-Mn ferromagnetic shape-memory alloy materials libraries, revealing reversible martensitic transformations and the associated transformation temperatures. Magneto-optical screening measurements of a materials library identify ferromagnetic samples, whereas resistivity maps support the discovery of new phases. A distance sensor in the same setup allows stress measurements in materials libraries deposited on cantilever arrays. A combination of these methods offers a fast and reliable high-throughput characterization technology for searching for new materials. Using this approach, a composition region has been identified in the Fe-Pd-Mn system that combines ferromagnetism and martensitic transformation.

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Sputter deposition of NiTi to investigate the Ti loss rate as a function of composition from cast melted targets

Cited by 20 publications

References 8 publications

Growth, microstructure and thermal transformation behaviour of epitaxial Ni-Ti films

Growth, microstructure and thermal transformation behaviour of epitaxial Ni-Ti films

Near Net-Shape Fabrication of Superelastic NiTi Devices by Sputtering and Photoetching

Modular high-throughput test stand for versatile screening of thin-film materials libraries

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