Sputter-Induced Compositional Change During ESCA/Sputtering of Polymers

Williams, Dwight E.; Davis, Lawrence E.

doi:10.1016/b978-0-12-442102-8.50008-5

Cited by 18 publications

(5 citation statements)

References 6 publications

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“…It is suggested that significantly heavy damage in organic materials manifests as a change in film stoichiometry such as carbonization, which occurs often in irradiation with energetic beams because of the higher sputtering effect of oxygen, hydrogen and elements other than carbon from the material surface. 11) The optical refractive indexes of the carbonized and original layer would have different values; i.e., the refractive index of the original organic layer is 1.3 -1.6 and that of amorphous carbon layer is about 2 À i. A more complex intermediate interface layer exists between the original layer and the damaged amorphous carbon layer.…”

Section: Introductionmentioning

confidence: 99%

Evaluation of Damage Layer in an Organic Film with Irradiation of Energetic Ion Beams

Hada

Ibuki

Ninomiya

et al. 2010

Jpn. J. Appl. Phys.

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We characterized the thickness and surface damage layer of poly(methyl metacrylate) (PMMA) organic films irradiated with Ar cluster or monomer ion beam using ellipsometry. A heavily damaged layer was detected on the surface of the PMMA film irradiated with Ar monomer ion beam; more than 2–3 nm of the surface were completely metamorphosed into a carbon-like layer and damage had accumulated with irradiation. On the other hand, no significant damage was detected on PMMA films irradiated with Ar cluster ion beams. These results corresponded with measurements of the irradiated surface by X-ray photoelectron spectroscopy (XPS). The sputtering depth from PMMA film irradiated with Ar cluster/monomer ion beams can also be measured using the ellipsometry method at nanometer-order resolution. The optical method of ellipsometry may be a desirable tool for sputtering yield measurement and surface damage layer estimation for organic films.

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Section: Introductionmentioning

confidence: 99%

Evaluation of Damage Layer in an Organic Film with Irradiation of Energetic Ion Beams

Hada

Ibuki

Ninomiya

et al. 2010

Jpn. J. Appl. Phys.

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“…At least, a portion of this variance in composition was explained by initial gradients which were present in the sample since the polyurethane that Williams and Davis studied is believed to contain various impurities and inhomogeneity due to the difficulty in mixing the reactants. 6 In our Auger sputtering studies, the intensity ratio of N/C in neither air surface nor in the substrate surface decreased as a function of sputtering. As indicated in Figure 5, the intensity ratio of N/C remains almost constant in the substrate surface while it increases as a function of sputter time in the air surface.…”

Section: Surface Chemical Composition Beyond First 10-15amentioning

confidence: 96%

“…However, when coupled with inert gas ion sputtering to continuously remove surface layers, a composition-depth profile can be obtained, provided that the sputtering is carried out at a low enough voltage to reduce the compositional change induced by sputtering. 6 Sample charging which occurs due to the nonconductive nature of the most of the polymers can hinder Auger analysis. The problem can be reduced in many cases by placing the sample in intimate contact with the conductive substrates.…”

Section: Introductionmentioning

confidence: 99%

Application of auger electron spectroscopy for surface chemical analysis of avcothane

Sung

1979

J. Biomed. Mater. Res.

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The effect of the exposure to air or to the substrate during the solvent casting process on the surface chemical composition of Avcothane, a blood compatible biomaterial, was studied by employing Auger electron spectroscopy. The surface layer of 10-15A thickness was analyzed without sputtering, but for the studies probing a deeper layer, argon ion sputtering at a low enough voltage to prevent artifacts was utilized. It is found that the air facing surface which is the blood contact surface contains a greater amount of silicone polymer and a much lower amount of the urethane hard segment in the first 10-15A-deep layer than in the comparably thick layer of the substrate surface. However, the depth-composition profile obtained by sputtering indicate that, probably at a deeper depth, the chemical compositions in terms of silicone polymer and hard segment is comparable both in the air side and the substrate side.

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“…[36] In a study on PMMA degradation by XPS, the carbonyl functionality was found to be sputtered preferentially at a fluence of 10 16 ions/cm 2 with 2 keV Ar + . [37] For the same polymer, using SIMS analysis, Briggs suggested that beam damage was observed at a fluence of 10 14 ions/cm 2 with Ne + bombardment, [36] which suggests that SIMS is more sensitive for the detection of beam induced beam damage than XPS. In a later, but more detailed study, they found that PMMA degrades at 1-2 × 10 14 ions/cm 2 with 4 keV Xe + bombardment.…”

Section: Introductionmentioning

confidence: 99%

Optimizing the sputter deposition process of polymers for the Storing Matter technique using PMMA

et al. 2016

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Quantitative analyses in secondary ion mass spectrometry (SIMS) become possible only if ionization processes are controlled. The Storing Matter technique has been developed to circumvent this so-called matrix effect, primarily for inorganic samples, but has also been extended to organic samples. For the latter, it has been applied to polystyrene in order to investigate the extent of damage in the polymer, its fragmentation during the sputter deposition process and the effect of the deposition process on the spectra taken by Time-of-Flight SIMS (ToF-SIMS). In this work, a multi-technique approach, which employs the Storing Matter technique for deposition and ToF-SIMS and X-ray photoelectron spectroscopy for characterization, is used to enhance the control of the deposition process, including the thickness of the deposit, the alteration of the source film and the influence of polymer composition on the Storing Matter process. Poly (methyl methacrylate) (PMMA) is used for this work. More detailed information about the sticking of polymer fragments on the metal collector is obtained by density functional theory calculations. This work allows for the conclusion that a part of the fragments deposited on the collector surface diffuses on the latter, reacts and recombines to form larger fragments. The behaviour observed for PMMA is similar to polystyrene, showing that oxygen has no major influence on the processes occurring during the sputter deposition process. Additionally, we have developed a new methodology using 2D ToF-SIMS images of the deposit to monitor the deposit thickness and to identify surface contaminations. The latter are not only located at the position of the deposit but all over the collector surface. Copyright © 2016 John Wiley & Sons, Ltd.

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Sputter-Induced Compositional Change During ESCA/Sputtering of Polymers

Cited by 18 publications

References 6 publications

Evaluation of Damage Layer in an Organic Film with Irradiation of Energetic Ion Beams

Evaluation of Damage Layer in an Organic Film with Irradiation of Energetic Ion Beams

Application of auger electron spectroscopy for surface chemical analysis of avcothane

Optimizing the sputter deposition process of polymers for the Storing Matter technique using PMMA

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