2020
DOI: 10.1016/j.apsusc.2019.144529
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Sputtering and nitridation of transition metal surfaces under low energy, steady state nitrogen ion bombardment

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Cited by 17 publications
(20 citation statements)
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“…The peaks at 399 and 401.3 eV correspond to N atoms of hexadecylamine and hexadecylammonium ions, respectively . The peak at low energy corresponds to N atoms adsorbed on the surface of the Ru NPs and/or to a surface nitridation of the Ru NPs . It shows a partial decomposition of the HDA, resulting from the C–N activation, likely catalyzed by the Ru nanoparticles in the presence of molecular hydrogen.…”
Section: Resultsmentioning
confidence: 98%
“…The peaks at 399 and 401.3 eV correspond to N atoms of hexadecylamine and hexadecylammonium ions, respectively . The peak at low energy corresponds to N atoms adsorbed on the surface of the Ru NPs and/or to a surface nitridation of the Ru NPs . It shows a partial decomposition of the HDA, resulting from the C–N activation, likely catalyzed by the Ru nanoparticles in the presence of molecular hydrogen.…”
Section: Resultsmentioning
confidence: 98%
“…Still, care should be taken regarding gas purity since the heavier ions may have significantly more impact on materials at the same ion energy, and both oxygen and nitrogen compounds may be chemically active. 61,62 Also, hydrocarbons and volatile hydrides may have a significant impact already at trace levels since these may be decomposed by the EUV to result in deposition of carbonaceous layers on mirrors 63 and reticles. 64…”
Section: Gas Puritymentioning
confidence: 99%
“…Charged particle-surface interactions as an important field have been intensively researched over several decades. Most studies have focused on, for instance, ion- or electron-induced sputtering and desorption, 1 ion stimulated surface electron emission, 2–4 energy loss, 5 and ion induced surface nanostructures. 6–9 The charge state in scattered beams after projectile scattering from an insulator ionic-crystal surface has received much attention.…”
Section: Introductionmentioning
confidence: 99%