2020
DOI: 10.1038/s41598-020-62642-3
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Sputtering-deposited amorphous SrVOx-based memristor for use in neuromorphic computing

Abstract: The development of brain-inspired neuromorphic computing, including artificial intelligence (AI) and machine learning, is of considerable importance because of the rapid growth in hardware and software capacities, which allows for the efficient handling of big data. Devices for neuromorphic computing must satisfy basic requirements such as multilevel states, high operating speeds, low energy consumption, and sufficient endurance, retention and linearity. In this study, inorganic perovskite-type amorphous stron… Show more

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Cited by 24 publications
(18 citation statements)
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“…1a). To our best knowledge, the two main features of analogue devices-the linear switching performance and the large dynamic range of Ti 4.8% :a-Si device-display a clear deviation from the previously reported Ag 9,10,15,17,18,[33][34][35][36][37][38][39][40][41][42][43] -and Cu 44,45 -based analogue CBRAM (Fig. 2c).…”
Section: Cluster-type Memristor By Engineering Reduction Probabilitycontrasting
confidence: 71%
“…1a). To our best knowledge, the two main features of analogue devices-the linear switching performance and the large dynamic range of Ti 4.8% :a-Si device-display a clear deviation from the previously reported Ag 9,10,15,17,18,[33][34][35][36][37][38][39][40][41][42][43] -and Cu 44,45 -based analogue CBRAM (Fig. 2c).…”
Section: Cluster-type Memristor By Engineering Reduction Probabilitycontrasting
confidence: 71%
“…Research on this device involves multiple disciplines and fields, such as materials, chemistry, physics, and biology. Its application fields include data storage, 11,12 neuropsychological calculation, 13,14 logic operations, 15 pattern recognition, 16−18 communication encryption, and brain chips. 19 In recent years, great progress has been made in the research of nanomaterials as active layers of RRAM, such as zerodimensional materials (Si, 20 quantum dots, 21 etc.…”
Section: Introductionmentioning
confidence: 99%
“…GaN is one of the most promising materials for power electronics with high electron mobility and a band gap of ∼3.3 eV, which can help to improve switching frequency, system volume, and energy conversion efficiency in electronic devices. For this work, we have used the sputtering technique for the deposition of the ZnO and GaN thin film. The sputtering is used to make memristors due to its simplicity, low cost, and large-scale deposition . We easily control the morphology, crystallinity, thickness, and surface roughness by tuning the sputtering parameters such as the power, pressure, temperature, and gas ratio.…”
Section: Introductionmentioning
confidence: 99%
“…The sputtering is used to make memristors due to its simplicity, low cost, and large-scale deposition. 39 We easily control the morphology, crystallinity, thickness, and surface roughness by tuning the sputtering parameters such as the power, pressure, temperature, and gas ratio.…”
Section: Introductionmentioning
confidence: 99%