“…In this process, no catalyst and no templates were used, and the growth mechanism of the c-GaN nanotubes might be markedly different from that of the templated ªepitaxial castingº during the growth of h-GaN nanotubes. [9] As depicted schematically in Figure 5, we postulate that the nucleation and growth of these c-GaN nanotubes occurs in three steps: i) As-formed Ga 2 O vapor reacts with NH 3 gas, forming GaN nanometer-sized nuclei in the flowing NH 3 and N 2 ; ii) The GaN nuclei are transported by the carrier gases of the flowing NH 3 and N 2 to a lower-temperature zone of the induction furnace. The processing conditions, such as the temperature distribution along the axial direction of the furnace, the carrier gas flow rate, the pressure inside the furnace, the gallium oxide species, and the reductive atmosphere (owing to the carbon material of the used crucible and induction furnace), and so on, will mainly dominate the dimensions, distribution, and concentration (in the flowing NH 3 and N 2 ) of the GaN nuclei.…”