2011
DOI: 10.1109/jdt.2011.2107879
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Stability of IZO and a-Si:H TFTs Processed at Low Temperature (200 $^{\circ}{\hbox{C}}$)

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Cited by 30 publications
(17 citation statements)
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“…The on/off ratio was approximately 10 5 . To the best of our knowledge, this mobility is higher than those of previously reported n-type CNT-TFTs fabricated on solid substrates [10,17,18,23,24] and those of n-type TFTs recently fabricated on plastic films, including organic TFTs [30][31][32][33][34], amorphous-Si TFTs [35][36][37][38][39], and oxide TFTs [40][41][42][43][44][45]. The high mobility would originate from the long and clean CNTs composing the channel formed by the dry filtration and transfer process.…”
Section: Resultsmentioning
confidence: 66%
“…The on/off ratio was approximately 10 5 . To the best of our knowledge, this mobility is higher than those of previously reported n-type CNT-TFTs fabricated on solid substrates [10,17,18,23,24] and those of n-type TFTs recently fabricated on plastic films, including organic TFTs [30][31][32][33][34], amorphous-Si TFTs [35][36][37][38][39], and oxide TFTs [40][41][42][43][44][45]. The high mobility would originate from the long and clean CNTs composing the channel formed by the dry filtration and transfer process.…”
Section: Resultsmentioning
confidence: 66%
“…2 shows that thin-film technologies such as a-Si:H and IZO display distinctly unstable dc characteristics after 10 000 s electrical bias. The InAs NW TFTs remain relatively stable for prolonged periods of electrical stress with a threshold voltage shift less than 0.25 V. In contrast, a-Si:H and InZnO shift by almost 9 and 1.7 V, respectively [7]. Since the NW devices operate at significantly lower drive voltages than the compared devices, it inherently lowers the potential V t shifts.…”
Section: Resultsmentioning
confidence: 98%
“…Realistically, however, each pixel's performance is dictated by manufacturing variations; a problem magnified by the wide parameter variance common in low temperature TFT processes [15,16,21]. To compensate for this response uncertainty, we quantified the variance of two key electrical parameters using measured data from transistors manufactured using an InGaZnO process: threshold voltage, V T, and electron mobility, �.…”
Section: A Modeling Methodologymentioning
confidence: 99%
“…Our dual stage APS design implements n-type thin film transistors fabricated in either a low temperature a-Si:H or InGaZnO FDC process [15,16]. Any incident charged radiation, or light, on the reverse-biased PIN diode will generate a small change in charge at the cathode.…”
Section: A Aps Functionalitymentioning
confidence: 99%