ABSTRACT. Bi2Se3, one of the most widely studied topological insulators (TIs), is naturally electron-doped due to n-type native defects. However, many years of efforts to achieve p-type Bi2Se3 thin films have failed so far. Here, we provide a solution to this long-standing problem, showing that the main culprit has been the high density of interfacial defects. By suppressing these defects through an interfacial engineering scheme, we have successfully implemented p-type Bi2Se3 thin films down to the thinnest topological regime. On this platform, we present the first tunable quantum Hall effect (QHE) study in Bi2Se3 thin films, and reveal not only significantly asymmetric QHE signatures across the Dirac point but also the presence of competing anomalous states near the zeroth Landau level. The availability of doping tunable Bi2Se3 thin films will now make it possible to implement various topological quantum devices, previously inaccessible.KEYWORDS. Topological insulator, Bi2Se3, Doping, Interface, Quantum Hall effect 3 Hole (p) doping has been challenging in Bi2Se3 1-3 , one of the most widely studied topological insulators (TIs) [4][5][6][7][8][9][10] . Unlike conventional semiconductor materials, the problem is complicated due to the presence of both surface and bulk states in topological insulators: we have to consider the doping problem of the surface and the bulk states separately. Both the surface and bulk states of Bi2Se3 have a strong tendency toward n-type due to its native n-type defects such as selenium vacancies [1][2][3][11][12][13][14][15][16][17] . In bulk crystals compensation dopants such as Ca and Mn can be used to convert the dominant carrier type from n-to p-type [18][19][20][21][22][23][24][25] . However, such a compensation doping scheme has not been successful in thin films of Bi2Se3. More specifically, we have tried various potential p-type dopants such as Zn, Mg, Ca, Sr, and Ba as compensation dopants, but none of them have so far led to p-type Bi2Se3 thin films; no p-type Bi2Se3 thin films have been demonstrated in the literature either. Only when they were quite thick (~200 nm), we were able to achieve p-type Bi2Se3 films through a complex process 8 . This difficulty in achieving p-type Bi2Se3 thin films has been puzzling, considering the very existence of p-type Bi2Se3 bulk crystals 19,20 . It may be suspected that this discrepancy in doping efficiency between thin films and bulk crystals could be due to the different growth conditions of the two systems, such as growth temperatures, considering that films are, in general, grown at much lower temperatures than bulk crystals. However, it should be noted that even p-type Bi2Se3 bulk crystals tend to become n-type when the crystals are made into thin flakes through, say, the Scotch tape method 26 . Bi2Se3 flakes can remain p-type only if they are relatively thick (> ~150 nm) 24 . All these observations provide evidence that whether they are thin films or bulk crystals, thickness critically affects the doping efficiency of the Bi2Se3 syst...