2017
DOI: 10.1016/j.microrel.2017.04.010
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Static fault localization of subtle metallization defects using near infrared photon emission microscopy

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Cited by 13 publications
(1 citation statement)
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“…The commonly used non-destructive FA methods such as electro optical frequency mapping and electro optical probing was not helpful on mixed signal IC if the failure was not frequency related [3]. Dynamic InGaAs photon emission microscopy is an effective non-destructive tool for FA to identify defective chip regions or problematic circuit blocks [4][5][6][7][8]. It can capture photoelectrons during the electron transition and process to visual images.…”
Section: Introductionmentioning
confidence: 99%
“…The commonly used non-destructive FA methods such as electro optical frequency mapping and electro optical probing was not helpful on mixed signal IC if the failure was not frequency related [3]. Dynamic InGaAs photon emission microscopy is an effective non-destructive tool for FA to identify defective chip regions or problematic circuit blocks [4][5][6][7][8]. It can capture photoelectrons during the electron transition and process to visual images.…”
Section: Introductionmentioning
confidence: 99%