2017
DOI: 10.1016/j.sse.2016.10.003
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Steep sub-threshold current slope (∼2mV/dec) Pt/Cu2S/Pt gated memristor with lon/Ioff>100

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Cited by 16 publications
(9 citation statements)
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“…This hydrogel sensor with FET was designed by using undoped and gold nanoparticle-doped hydrogel as the channel material in an open-channel FET structure. In earlier publications, we have reported the fabrication and characterization of this device, used as a platform for experimenting with different post-deposited channel materials [ 30 , 31 ]. The FET consisted of a bottom-embedded gate with hafnium oxide gate dielectric [ 30 , 31 ] and surface-exposed platinum drain and source electrodes with effective channel length of 1 µm.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…This hydrogel sensor with FET was designed by using undoped and gold nanoparticle-doped hydrogel as the channel material in an open-channel FET structure. In earlier publications, we have reported the fabrication and characterization of this device, used as a platform for experimenting with different post-deposited channel materials [ 30 , 31 ]. The FET consisted of a bottom-embedded gate with hafnium oxide gate dielectric [ 30 , 31 ] and surface-exposed platinum drain and source electrodes with effective channel length of 1 µm.…”
Section: Methodsmentioning
confidence: 99%
“…This phenomenon was then exploited to design a novel metal-oxide-hydrogel field-effect transistor (MOHFET) whose channel material is a smart hydrogel. The MOHFET [ 28 ] design was based on an open-face Field-Effect Transistor (FET) structure reported before [ 28 , 29 , 30 , 31 ]. Here, drop-casting was used for depositing the hydrogel channel.…”
Section: Introductionmentioning
confidence: 99%
“…Gate tunability of the switching voltage threshold has also been achieved in TiO x memristors [ 144 ] and Cu 2‐α S memristors, but with weaker field‐effect modulation. [ 145,146 ] These examples illustrate that thinner materials provide the most effective gate modulation by allowing for independent control over the volatile channel conductance states and non‐volatile memristive states. As the size of the neuromorphic memtransistor circuits increases, the requirement for low off‐current becomes more stringent, [ 77 ] suggesting that larger bandgap 2D semiconductors with larger resistive switching ratios will be required.…”
Section: Memtransistor Materials Mechanisms and Architecturesmentioning
confidence: 99%
“…We next incorporated the NP-VO2 in the channel of an open-channel FET that were fabricated on a glass substrate with a 100 nm Pt gate covered by a 50 nm atomic layer deposited (ALD) HfO2 dielectric and a 100 nm Pt drain and source electrodes, as shown in Figures 4a and 4b. The fabrication process is discussed in [14] and was started with etching a 4" glass substrate by immersing it in buffered oxide etch (BOE) for 1 minute to create 100 nm deep trenches for the gate metallization Next, we examined the slope of the I-V at V T /2 (see Figure 2b). This slope can be viewed as the switching current slope denoted by S c .…”
Section: Device Studiesmentioning
confidence: 99%