Step and flash imprint lithography for manufacturing patterned media

Schmid, Gerard M.; Miller, Mike; Brooks, Cynthia B.; Khusnatdinov, Niyaz; LaBrake, Dwayne; Resnick, Douglas J.; Sreenivasan, S. V.; Gauzner, Gene; Lee, Kyung Hwa; Kuo, David; Weller, D.; Yang, XiaoMin

doi:10.1116/1.3081981

Cited by 47 publications

(17 citation statements)

References 11 publications

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“…The progress and challenges of BPM imprint lithography on disks have been discussed in our previous studies. 25,26 After imprint, a reverse tone process is applied to convert the initial imprint resist hole-tone pattern into a silicon oxide pillar-tone pattern using HSQ spin coating first and then etching back with CF 4 RIE. Then, in preparation for next magnetic material etch, the silicon oxide pillartone pattern is used as an etching mask to etch into a thin carbon hard mask.…”

Section: Resultsmentioning

confidence: 99%

Fabrication of servo-integrated template for 1.5 Teradot/inch²bit patterned media with block copolymer directed assembly

Yang

Xiao

Hsu

et al. 2014

J. Micro/Nanolith. MEMS MOEMS

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Abstract. Directed self-assembly (DSA) of block copolymers (BCPs) proves to be a viable solution for the ultrahigh density bit-patterned media (BPM) application. However, servo design integration is still extremely challenging since the servo layouts require more complex patterns than the simple arrays naturally achieved by the DSA process. We present an integration scheme to create BPM servo patterns by utilizing the BCP dot-array patterns. This proposed method is based on an imprint guided two-step DSA process, combined with conventional optical lithography to define two separate zones. Both the data zone and servo zone consist of selfassembled hexagonal dot arrays: a regular pattern in the data zone and an arbitrary pattern in the servo zone. This method was successfully used to fabricate a servo-integrated BPM template with an areal density of 1.5 Teradot∕inch 2 (Td∕in: 2 ) (L o ¼ 22.3 nm). Using the fabricated quartz template, CoCrPt BPM media has been successfully patterned by nanoimprint lithography and subsequent ion-beam etching process on a 2.5 in. disk. Further, using patterned-in servo wedges on 1.5 Td∕in:2 patterned CoCrPt media, we are able to close the servo control loop for track-following on a spin-stand test. The standard deviation of repeatable run-out over the full revolution is calculated to be about 4% of the 38.6 nm track pitch. This method is currently being used to fabricate a template at a much higher density of 3.2 Td∕in: 2 (L o ¼ 15.2 nm). © The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Section: Resultsmentioning

confidence: 99%

Fabrication of servo-integrated template for 1.5 Teradot/inch²bit patterned media with block copolymer directed assembly

Yang

Xiao

Hsu

et al. 2014

J. Micro/Nanolith. MEMS MOEMS

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“…Ultraviolet nanoimprint lithography (UV-NIL) [1][2][3] is a recently developed technology that allows low-cost nanofabrication. UV-NIL has strong potential for application in the production of MEMS/NEMS, large-scale integrated circuits, and patterned media [4][5][6]. Bubble-free filling is necessary to achieve high-throughput mass production using UV-NIL.…”

Section: Introductionmentioning

confidence: 99%

Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere

Suzuki

Youn

Hiroshima

2018

J. Photopol. Sci. Technol.

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Bubble-free filling needs to be achieved to realize high-throughput mass production in ultraviolet nanoimprint lithography (UV-NIL). Polydimethylsiloxane (PDMS) is a gastransmittable material because of its molecular features and is used as the base material for flexible molds in large-area UV-NIL. In this work, we investigated the filling behavior and mold release force of UV-NIL using a soft UV-curable PDMS mold in different atmospheres. Bubble-free filling was successfully demonstrated in air and 1,1,1,3,3-pentafluoropropane (PFP) gas atmosphere. The average release force following UV-NIL in PFP was 5.2 N, which was 70% smaller than that following UV-NIL in air. Defect-free fine nanopatterns with a width of 300 nm were fabricated by UV-NIL in PFP atmosphere.

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“…Electron beam direct writing combined with nanoimprint lithography is currently considered to be the only choice for this application [2,4,5]. Although high-resolution BPM dots-array patterning up to ∼4.5 Td/in 2 has been previously demonstrated using direct e-beam writing [6,7], it still remains very challenging to achieve a defect-free dense dotsarray pattern over a full disk size area by only using the conventional e-beam lithography approach even for a master template fabrication.…”

Section: Introductionmentioning

confidence: 99%

Directed Self‐Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch² and Beyond

Yang

Xiao

Hsu

et al. 2013

Journal of Nanomaterials

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Directed self-assembly (DSA) of block copolymer (BCP) holds great promise for many applications in nanolithography, including the next generation magnetic recording. In this work, directed self-assembly of block copolymer technique has been combined with rotary stage electron beam mastering to fabricate a circular full track nanoimprint template for bit patterned media (BPM) fabrication. In order to meet specific requirements in pattern structure and format between the data and the servo zone in a servo-integrated template, three types of lithographically defined prepatterns, (1) two-dimensional chemical pre-pattern, (2) twodimensional low-topographic pre-pattern, and (3) one-dimensional high-topographic pre-pattern, have been explored for DSA process with two types of commercially available BCP thin film materials: cylinder-forming poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and sphere-forming poly(styrene-b-dimethylsiloxane) (PS-b-PDMS). All guided BCP patterns exhibit highly ordered hexagonal close-packed (hcp) structures with high pattern quality. Using these BCP patterns, two polarities of dots-array templates (hole-tone and pillar-tone) with integrated servo patterns have been fabricated on a fused silica substrate at a density greater than 1.0 Td/in 2. Furthermore, the fabricated master template has been used for UV-cure nanoimprint lithography process development on 2.5 inch disk size media. Good pattern uniformity in imprint resist has been achieved over an entire 2.4 mm wide band area. The imprint resist patterns have been further transferred into underlying CoCrPt media by ion beam etching. Evidently, for the first time, the patterned CoCrPt alloy dots (hcp pattern) have successfully been demonstrated at a high density of 1.5 Td/in 2 (pitch = 22.3 nm) for a guided media (≅ 7 kOe) and 3.2 Td/in 2 (pitch = 15.2 nm) for an unguided media (≅ 5 kOe).

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Step and flash imprint lithography for manufacturing patterned media

Cited by 47 publications

References 11 publications

Fabrication of servo-integrated template for 1.5 Teradot/inch²bit patterned media with block copolymer directed assembly

Fabrication of servo-integrated template for 1.5 Teradot/inch²bit patterned media with block copolymer directed assembly

Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere

Directed Self‐Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch² and Beyond

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Step and flash imprint lithography for manufacturing patterned media

Cited by 47 publications

References 11 publications

Fabrication of servo-integrated template for 1.5 Teradot/inch2bit patterned media with block copolymer directed assembly

Fabrication of servo-integrated template for 1.5 Teradot/inch2bit patterned media with block copolymer directed assembly

Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere

Directed Self‐Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch2 and Beyond

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Fabrication of servo-integrated template for 1.5 Teradot/inch²bit patterned media with block copolymer directed assembly

Fabrication of servo-integrated template for 1.5 Teradot/inch²bit patterned media with block copolymer directed assembly

Directed Self‐Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch² and Beyond