2008 8th IEEE Conference on Nanotechnology 2008
DOI: 10.1109/nano.2008.149
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Steps Towards Fabricating Cryogenic CMOS Compatible Single Electron Devices

Abstract: We describe the development of a novel silicon quantum bit (qubit) device architecture that involves using materials that are compatible with a Sandia National Laboratories (SNL) 0.35 μm complementary metal oxide semiconductor (CMOS) process intended to operate at 100mK. We describe how the qubit structure can be integrated with CMOS electronics, which is believed to have advantages for critical functions like fast single electron electrometry for readout compared to current approaches using radio frequency te… Show more

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Cited by 4 publications
(1 citation statement)
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“…Current-voltage measurements of p-and n-channel partially-depleted silicon-oninsulator (SOI) MOSFETs that were fabricated in the Sandia National Laboratories 0.35 µm CMOS7 process line [25] were taken at 4 K using a Lakeshore cryogenic probe station. The sample was thermally mounted to a copper chuck inside an evacuated test chamber, and then cooled by continuous-transfer of liquid Helium.…”
Section: K Cmos7 Soi-mosfet Modelingmentioning
confidence: 99%
“…Current-voltage measurements of p-and n-channel partially-depleted silicon-oninsulator (SOI) MOSFETs that were fabricated in the Sandia National Laboratories 0.35 µm CMOS7 process line [25] were taken at 4 K using a Lakeshore cryogenic probe station. The sample was thermally mounted to a copper chuck inside an evacuated test chamber, and then cooled by continuous-transfer of liquid Helium.…”
Section: K Cmos7 Soi-mosfet Modelingmentioning
confidence: 99%