Stopping power measurements for 16O, 19F and 28Si ions in Mylar by a transmission technique

Stopping power measurements with the Time-of-Flight (ToF) technique

“…These include: measuring the energy loss of alpha particles from alpha emitters (i.e. 241 Am and 212 Bi) and converting to thickness from tabulated energy loss values [12], measuring the energy loss of an alpha beam [10,11,36,37,40,[64][65][66][67], measuring the energy loss of a Li beam [26] and determining the thickness using tabulated stopping power values [68], direct measurement of the film thickness from cross sectional micrographs using TEM with surface roughness evaluated by Scanning Electron Microscopy (SEM) [11,[69][70][71], weight and area measurements [26,30,56,72], by Rutherford Backscattering Spectrometry (RBS) on films grown on bulk substrates [62,65,70,73], and by NIR spectrometry by comparing simulated and measured reflection spectra [18]. AFM [6,67,73], and profilometry [62], have been used to determine the surface roughness and its contribution to the uncertainty.…”

“…Some researchers have used ToF detectors to measure the initial ion energy and an energy detector to measure the final energy [4,27,66,72]. Others use the energy detector only to tag the energies [26,37,38,56,63,65,74].…”