2011
DOI: 10.1103/physrevb.83.153406
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Strain dependence for microscopic growth parameters for Ag on Ag(100)

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Cited by 9 publications
(8 citation statements)
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“…For example, in thin film growth, lattice mismatches lead to strains and eventually different film morphologies 15 . The effect of externally applied strain has also been shown to enhance the rate of material dissolution and the formation of etch pits 16 , modify the diffusion rate of impurities in nanowires 17 , and qualitatively change the behavior of both atom detachment from a step, and dimer dissociation of Ag on an Ag(100) surface 18 . Another source of strain that is commonly discounted in kMC simulations is thermal expansion: the rate catalog is often based on defect properties calculated in a constant volume ensemble, using the lattice parameter computed at T = 0 K 19,20 .…”
Section: Introductionmentioning
confidence: 99%
“…For example, in thin film growth, lattice mismatches lead to strains and eventually different film morphologies 15 . The effect of externally applied strain has also been shown to enhance the rate of material dissolution and the formation of etch pits 16 , modify the diffusion rate of impurities in nanowires 17 , and qualitatively change the behavior of both atom detachment from a step, and dimer dissociation of Ag on an Ag(100) surface 18 . Another source of strain that is commonly discounted in kMC simulations is thermal expansion: the rate catalog is often based on defect properties calculated in a constant volume ensemble, using the lattice parameter computed at T = 0 K 19,20 .…”
Section: Introductionmentioning
confidence: 99%
“…> 0 means tensile strain, and < 0 compressive strain. In these studies, d typically varies linearly and increases monotonically with increasing over the explored range, [35][36][37][38] although distinct behavior can occasionally occur on some surfaces. 39,40 Our DFT analysis for Pb on Bi2Te3(111) shows that d is not a monotonic function of in the small-regime and has a cusp-like minimum at c ≈ +0.8%, in contrast to the typical behavior on conventional metal or semiconductor surfaces, where the -dependent d is linear for = −1% to +1%.…”
mentioning
confidence: 98%
“…At the same time, research has suggested that the growth kinetics of heteroepitaxial thin-film systems can be strongly dependent on epitaxial strain. In both metal 15 16 and semiconductor 17 systems, the diffusion of adatoms can be strongly influenced by the surface strain. For instance, the activation energies for Ag self-diffusion can vary greatly depending on the strain state with considerably lower values being observed for diffusion on a strained, pseudomorphic Ag monolayer on Pt (111) (60 meV) as compared to unstrained Ag (111) surfaces (97 meV) 6 .…”
mentioning
confidence: 99%