2016
DOI: 10.1364/ao.56.00c131
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Stress control in optical thin films by sputtering and electron beam evaporation

Abstract: It is necessary to control the internal stress of optical thin films in order to address problems such as peeling and cracking. Internal stress differs among films prepared by different deposition methods. We investigated the internal stress of films prepared by sputtering, electron beam (EB) evaporation, and a combination deposition method that we developed. The internal stress was successfully controlled, showing a value between that of EB evaporation and sputtering.

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Cited by 11 publications
(3 citation statements)
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“…The device using sputtering strategies shows ~5–15% higher performance than that using E-beam deposition. Generally, magnetic sputtering can demonstrate a higher uniformity and film density than E-beams, which further affects the mechanical, electrical, and thermal contacts 47 , eventually improving the performance of PTE detectors.…”
Section: Resultsmentioning
confidence: 99%
“…The device using sputtering strategies shows ~5–15% higher performance than that using E-beam deposition. Generally, magnetic sputtering can demonstrate a higher uniformity and film density than E-beams, which further affects the mechanical, electrical, and thermal contacts 47 , eventually improving the performance of PTE detectors.…”
Section: Resultsmentioning
confidence: 99%
“…Meanwhile, the contact angle of the photocatalytic glass temporarily increased after storage in the dark, but it decreased again after UV irradiation on the IVC-22 Conference We have developed a combination coating method wherein electron beam (EB) deposition and direct current (DC) pulse sputtering are operated simultaneously in the same vacuum chamber. We have successfully reduced the refractive index of SiO 2 optical thin films [4][5][6]. In the combination coating method, the film structure becomes columnar and has a low-density, resulting in a low refractive index.…”
Section: Introductionmentioning
confidence: 99%
“…[18][19][20][21] In addition, the phonon frequency in singlecrystal Si was estimated using the combined method and modeling. 22) Nanoindentation is frequently used to measure the elastic modulus and hardness of structural materials, 23,24) and group velocity can be estimated from the elastic modulus. Therefore, the combined method has the potential to measure the phonon transport properties of amorphous materials, which can be used to elucidate the origin of their ultralow thermal conductivity.…”
mentioning
confidence: 99%