Stress Control of an Optical Thin Film by Sputtering and Vacuum Deposition

Tajima, Naoya; Murotani, Hiroshi; Matumoto, Shigeharu; Honda, Hiromitu

doi:10.1364/oic.2016.wb.9

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“…Nevertheless, the methods have limitations as well. Last but not least, since thin films fabricated by EBE and PIAD can be manipulated as tensile or compressive stress [7,23,24], the films prepared using MS and IBS are commonly compressive stress [9,11,17]. It is possible to realize stress control by combining several coating technologies.…”

Section: Introductionmentioning

confidence: 99%

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Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Guo

Kong

2020

Coatings

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Optical and mechanical properties of multilayer coatings depend on the selected layer materials and the deposition technology; therefore, knowledge of the performances of thin films is essential. In the present work, titanium dioxide (TiO2) and silicon dioxide (SiO2) thin films have been prepared by plasma ion-assisted deposition (PIAD). The optical, structural, and mechanical properties of thin films have been investigated using spectrometer/ellipsometer, X-ray diffraction (XRD), atomic force microscopy (AFM), and laser interferometer. The results show that TiO2 film fabricated by PIAD induces a high refractive index, wide optical band gap, amorphous structure, smooth surface, and tensile stress. In the case of SiO2 film, high bias voltage leads to dense structure and compressive stress. As an application, a three-wavelength high reflectance at 632.8, 808, and 1550 nm was optimized and deposited. The dependence of total stress in the multilayer on the substrate temperature was studied as well. In conclusion, it was demonstrated that PIAD is an effective method for the preparation of ultralow stress TiO2/SiO2 multilayer films. The achieved stress was as low as 1.4 MPa. The result could provide guidance to the stress optimization of most optical components without prefiguring, backside coating, and postdeposition treatments.

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Section: Introductionmentioning

confidence: 99%

“…It is possible to realize stress control by combining several coating technologies. Tajima et al [23] have studied the stress control of SiO 2 film by simultaneous sputtering and EBE. As a result, the obtained stress of SiO 2 film prepared with the proposed method is approximately 60% of that by EBE and one-fourth of that by sputtering.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Guo

Kong

2020

Coatings

View full text Add to dashboard Cite

show abstract

Stress Control of an Optical Thin Film by Sputtering and Vacuum Deposition

Cited by 1 publication

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Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

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