Stress evolution during and after sputter deposition of Cu thin films onto Si (100) substrates under various sputtering pressures

Pletea, M.; Brückner, W.; Wendrock, H.; Kaltofen, R.

doi:10.1063/1.1858062

Cited by 54 publications

(45 citation statements)

References 31 publications

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“…To date, the accumulation of extensive experimen tal data on the physics and technology of thin films has made it possible to formulate some empirical regular ities (predominantly, in the technological aspect) of the generation of internal stresses in thin films [1][2][3][4]. In particular, the decisive factor in such processes is the rate of condensation.…”

Section: Introductionmentioning

confidence: 99%

Internal mechanical stresses and the thermodynamic and adhesion parameters of the metal condensate-single-crystal silicon system

Coman

Juzevych

2012

Phys. Solid State

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The kinetics of generation of internal mechanical stresses σ(d) in chromium, copper, gold, and aluminum thin films on single crystal silicon substrates at different deposition rates has been experimentally investigated using the cantilever method. A two step character of the variations in internal tensile stresses has been revealed. The regularities of the formation of the maximum level of mechanical stresses in the conden sates under investigation have been established. The energy and adhesion parameters of chromium, copper, gold, and aluminum nanolayers on silicon, germanium, and nickel substrates have been studied using the macroscopic methods of surface physics. The interfacial energy, interfacial tension, work of adhesion, inter facial charge, and a new energy characteristic of the interfacial layer, namely, the energy of adhesive bonds, which exceeds the interfacial energy, have been determined.

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Section: Introductionmentioning

confidence: 99%

Internal mechanical stresses and the thermodynamic and adhesion parameters of the metal condensate-single-crystal silicon system

Coman

Juzevych

2012

Phys. Solid State

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“…The increase of compressive stress during the postcoalescence process has been widely reported. 28,29 It has been attributed to capillaryinduced growth stress due to the smaller lattice parameter of the nanoislands with respect to equilibrium. 14 In addition, the effect of the increase in the surface chemical potential caused by the deposition of atoms from the vapor has been pointed out, which induces atoms to flow into the grain boundaries.…”

Section: B Gold-film-induced Cantilever Strainmentioning

confidence: 99%

Role of the gold film nanostructure on the nanomechanical response of microcantilever sensors

Mertens

Calleja

Ramos

et al. 2007

Journal of Applied Physics

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In this study, we have determined the relationship between the nanostructure of the gold film deposited on microcantilevers and the sensitivity and reproducibility of their static response to molecular adsorption. In order to tune the properties of the gold film, gold was deposited at different rates and thicknesses. The cantilever response to molecular adsorption was characterized by exposure of the cantilevers to mercaptohexanol in water. The morphology of the gold surface was characterized by atomic force microscopy, and the residual stress induced in the cantilevers was characterized by a profilometry technique based on the optical beam deflection method. We have found that the discontinuous morphology of the gold film for small thicknesses and low deposition rates gives rise to large values of residual tensile stress due to the formation of grain boundaries at the expense of strain energy. These cantilevers exhibit the highest sensitivity and reproducibility to molecular adsorption. However, larger thicknesses and higher deposition rates produce the coalescence of gold nanoislands via atom diffusion. This is characterized by a large relative decrease ͑increase͒ of the tensile ͑compressive͒ stress. These cantilevers exhibit small sensitivity and low reproducibility to molecular adsorption. We conclude that the control of the gold coating process is critical for the reliability of the measurements with nanomechanical sensors.

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“…11 Many investigations have used magnetron sputtering for preparation of Cu films 12,13 as well. In this research, reactive radio frequency (RF) magnetron sputtering was used to prepare Cu and Cu oxide films with various oxygen ratios in the sputtering gas.…”

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confidence: 99%

Spectroscopic and Morphological Investigation of Copper Oxide Thin Films Prepared by Magnetron Sputtering at Various Oxygen Ratios

Park¹,

Lim²,

Ramsier³

et al. 2011

Bulletin of the Korean Chemical Society

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Copper oxide thin films were synthesized by reactive radio frequency magnetron sputtering at different oxygen gas ratios. The chemical and physical properties of the thin films were investigated by X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), atomic force microscopy (AFM), and X-ray diffraction (XRD). XPS results revealed that the dominant oxidation states of Cu were Cu 0 and Cu + at 0% oxygen ratio. When the oxygen ratios increased above 5%, Cu was oxidized as CuO as detected by X-ray induced Auger electron spectroscopy and the Cu(OH) 2 phase was confirmed independent of the oxygen ratio. The valence band maxima were 1.19 ± 0.09 eV and an increase in the density of states was confirmed after formation of CuO. The thickness and roughness of copper oxide thin films decreased with increasing oxygen ratio. The crystallinity of the copper oxide films changed from cubic Cu through cubic Cu 2 O to monoclinic CuO with mean crystallite sizes of 8.8 nm (Cu) and 16.9 nm (CuO) at the 10% oxygen ratio level.

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Stress evolution during and after sputter deposition of Cu thin films onto Si (100) substrates under various sputtering pressures

Cited by 54 publications

References 31 publications

Internal mechanical stresses and the thermodynamic and adhesion parameters of the metal condensate-single-crystal silicon system

Internal mechanical stresses and the thermodynamic and adhesion parameters of the metal condensate-single-crystal silicon system

Role of the gold film nanostructure on the nanomechanical response of microcantilever sensors

Spectroscopic and Morphological Investigation of Copper Oxide Thin Films Prepared by Magnetron Sputtering at Various Oxygen Ratios

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