2009
DOI: 10.1116/1.3054269
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Stress-induced leakage current and random telegraph signal

Abstract: Articles you may be interested inModel of random telegraph noise in gate-induced drain leakage current of high-k gate dielectric metal-oxidesemiconductor field-effect transistors Appl. Phys. Lett. 100, 033501 (2012); 10.1063/1.3678023 Random telegraph noise of junction leakage current in submicron devicesLow voltage stress induced leakage currents and surface states in ultrathin (1.2-2.5 nm) oxides

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Cited by 5 publications
(1 citation statement)
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“…Array test circuits have also been proposed to measure the small current of DUTs, such as leakage current across capacitors and p-n junction leakage current. [22][23][24][25][26][27][28] Using them, the leakage current of DUTs can be measured for statistical evaluation of the electrical characteristics such as stress-induced leakage current (SILC) of MOSFETs. Toward evaluation of emerging memory materials with high versatility, an array test circuit platform for measuring the resistance of memory materials has been proposed where DUTs are formed on the platform circuit in an additional process with simple steps.…”
Section: Introductionmentioning
confidence: 99%
“…Array test circuits have also been proposed to measure the small current of DUTs, such as leakage current across capacitors and p-n junction leakage current. [22][23][24][25][26][27][28] Using them, the leakage current of DUTs can be measured for statistical evaluation of the electrical characteristics such as stress-induced leakage current (SILC) of MOSFETs. Toward evaluation of emerging memory materials with high versatility, an array test circuit platform for measuring the resistance of memory materials has been proposed where DUTs are formed on the platform circuit in an additional process with simple steps.…”
Section: Introductionmentioning
confidence: 99%