2006
DOI: 10.1109/led.2006.879023
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Structural advantage for the EOT scaling and improved electron channel mobility by incorporating dysprosium oxide (Dy/sub 2/O/sub 3/) into HfO/sub 2/ n-MOSFETs

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Cited by 29 publications
(1 citation statement)
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“…There are two typical methods that have been used to tune the V th of the device. The first approach is physical methods, which use an appropriate high-k metal gate stack [10] or additional processes such as threshold adjustment implantation [11] , capping layer [12] and plasma treatment [13] . The second method is an electrical method that changes the channel potential by bulk/back-gate bias (V B ), such as utilizing a bulk electrode or an additional gate electrode [14−19] .…”
Section: Introductionmentioning
confidence: 99%
“…There are two typical methods that have been used to tune the V th of the device. The first approach is physical methods, which use an appropriate high-k metal gate stack [10] or additional processes such as threshold adjustment implantation [11] , capping layer [12] and plasma treatment [13] . The second method is an electrical method that changes the channel potential by bulk/back-gate bias (V B ), such as utilizing a bulk electrode or an additional gate electrode [14−19] .…”
Section: Introductionmentioning
confidence: 99%