Structural and electrical characterisation of Mo films for transition-edge sensors

Monticone, E.; Rajteri, M.; Portesi, C.; Gandini, C.; Bodoardo, Silvia; Picotto, G. B.

doi:10.1016/s0921-4534(02)00718-9

Cited by 6 publications

(8 citation statements)

References 8 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The average critical temperature of Mo films with thickness dMo>35-40 nm grown in parallel to the bilayers analysed is Tco=999±11 mK; for thinner films finite thickness effects are observed [7]. This value is in good agreement with previous results of Tco for bare sputtered Mo films, full within the range of critical temperatures reported for Mo thin films [6,7,16,17,18] but somehow above the critical temperature of bulk Mo, 915 mK.…”

Section: Resultssupporting

confidence: 90%

See 1 more Smart Citation

Exploring the Proximity Effect in Mo/Au Bilayers

Fàbrega

Camón

Strichovanec

et al. 2019

IEEE Trans. Appl. Supercond.

View full text Add to dashboard Cite

We report on the sensitivity of superconducting transition temperature (Tc) to the individual layers' thickness in Mo/Au proximity bilayers to be used in Transition-Edge Sensors. The achieved good reproducibility and quality of the bilayers allow a clear determination of the superconducting critical temperature Tc as a function of the Mo and Au thicknesses. One objective of this work is to analyse the quality of the Mo-Au interface and to assess the possible effects of the double Au layer we use to fabricate these bilayers and TESs based on them. Experimental data are analysed on the base of Usadel equations using the model developed by Martinis and co-workers, in which the proximity effect in the bilayer is mainly governed by the interface transparency between the superconductor and the normal metal. We find that this model describes quite well the behaviour of Tc, even for quite thick Au layers, and that the double Au layer does not play any relevant role on the proximity effect.

show abstract

Section: Resultssupporting

confidence: 90%

“…This gives further coherence to the analyses and fits. The t values obtained are similar to those reported for Mo-based bilayers that constitute TESs with excellent performances [16,17,18,20,21].…”

Section: Resultssupporting

confidence: 85%

Exploring the Proximity Effect in Mo/Au Bilayers

Fàbrega

Camón

Strichovanec

et al. 2019

IEEE Trans. Appl. Supercond.

View full text Add to dashboard Cite

show abstract

“…These values are very much similar to those usually found for Mo thin films deposited by sputtering and e-beam but are substantially lower than those of high-purity Mo single crystals. The high ρ n and low RRR values of granular metal thin films are usually ascribed to enhanced scattering occurring at grain boundaries [2], [3], [18], [29], [30]. This fact is further analyzed in the succeeding paragraphs.…”

Section: B Normal-state Resistivitymentioning

confidence: 99%

“…Several reports have emphasized the relationship between T c and stress in Mo films. For films deposited by e-beam, T c and RRR rise as tensile stress is suppressed [5], [15]- [18]. A few reports focused on dc magnetron-sputtered films report that the best T c (∼1-1.4 K) and reproducibility are obtained for slightly compressed films (σ ∼ −100 MPa) [6], [17].…”

Section: Superconducting Critical Temperaturementioning

confidence: 99%

“…Because of the relevance of the electric conductivity of the films, some studies [2]- [4], [12]- [14] were focused on the correlation of morphology and stress with electric properties-mainly room temperature resistivity. However, even when Mo thin films have been proposed as very suitable candidates for TESs, only a few papers are devoted to the correlation of stress and morphology with the superconducting critical temperature [5], [6], [15]- [18]. In fact, there is a considerable lack of understanding of how morphology and stress affect the superconducting properties of Mo thin films, which hampers further improvement of superconducting Mobased devices.…”

mentioning

confidence: 99%

See 1 more Smart Citation

Effects of Stress and Morphology on the Resistivity and Critical Temperature of Room-Temperature-Sputtered Mo Thin Films

Fàbrega

Fernández-Martínez

Parra-Borderías

et al. 2009

IEEE Trans. Appl. Supercond.

View full text Add to dashboard Cite

We report on the structural and electrical characterization of Mo thin films deposited at room temperature by RF magnetron sputtering. The effect of RF power on the morphology and residual stress of the films is analyzed. The films are under compressive stress and consist of densely packed columns with a lateral size on the order of 20 nm. The stress, critical temperature, and resistivity of the films are found to rise when increasing the ejected ion energy during the sputtering process. The changes in critical temperature and resistivity are discussed in terms of the observed morphology and stress changes.

show abstract