Structural and magnetic properties of pulsed laser deposited Fe–SiC thin films

Kumar, Mukesh; Chandra, Ramesh; Goyat, M.S.; Mishra, Raghwesh; Tiwari, Rajesh Kumar; Saxena, A. K.

doi:10.1016/j.tsf.2015.02.012

Cited by 7 publications

(3 citation statements)

References 31 publications

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“…Nonetheless, previous reports have indicated that FeSiC metal matrix composites were produced by sintering at 900°C. 15) These reports have also indicated that aside from FeSiC thin films, pulse laser deposition also produced Fe 3 Si compounds other than the SiC phase after the films were annealed at 1073 K for 2.5 h. 16) XPS analysis showed that the SiCN phase consisted of SiC, SiN, and CN bonds. The Si 2p spectrum of the #4HV sample showed that the fraction of SiC bonds decreased and SiFe bonds appeared after annealing.…”

Section: Discussionmentioning

confidence: 95%

“…CrSiCN thin films/coatings have been extensively studied owing to their high hardness, low friction coefficient, and good wear properties. 16) These properties are attributed to the structure of the nanocomposite, which consists of nanocrystalline CrN and an amorphous SiCN phase (a-SiCN). 5) Additionally, the structure of the nanocomposite likely confers the films/coating with excellent oxidation resistance.…”

Section: Introductionmentioning

confidence: 99%

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Influence of Iron Diffusion on the Oxidation Resistance of CrSiCN Hard Coatings

et al. 2022

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Radiofrequency (RF) reactive magnetron sputtering was used to deposit thin SiCN and CrSiCN films on high-speed steel or silicon substrates. Nanoindentation, scanning electron microscopy/energy dispersive X-ray spectroscopy (SEM-EDS), transmission electron microscopy (TEM), and X-ray photoelectron spectroscopy (XPS) analyses were used to investigate the changes in the mechanical properties and microstructure of the CrSiCN films after annealing. The CrSiCN (37.6%Cr) film deposited on the Si substrate showed little change (¹12%) in the indentation hardness and microstructure after annealing in air at 800°C for 1 h. Comparatively, the hardness of the same films deposited on high-speed steel substrates was greatly degraded (¹36% to ¹50%). The microstructure of the films also changed remarkably after annealing in air or even under vacuum using the same temperature and time conditions. TEM/XPS analyses suggested that the mechanism of degradation of the CrSiCN films involved decomposition of the SiCN phase, induced by CrN and diffusion of Fe from the substrate. The diffusion of Fe formed FeSi in the films, while CrN generated CrC, which induced grain growth of the CrN phase and degraded the indentation hardness of the films. Thermodynamic calculations were performed to demonstrate the possibility of these reactions. The formation of crater wear faults in the CrSiCN hard coatings used for machining tools was also discussed.

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Section: Discussionmentioning

confidence: 95%

Section: Introductionmentioning

confidence: 99%

Influence of Iron Diffusion on the Oxidation Resistance of CrSiCN Hard Coatings

et al. 2022

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“…Several techniques are used for the synthesis of SiC thin films. Some of the common methods are chemical vapor deposition (CVD) [9,10], pulsed laser deposition (PLD) [11,12], molecular beam epitaxy [13,14] and reactive magnetron sputtering [15][16][17]. Among these techniques reactive magnetron sputtering is most attractive due to low substrate temperature deposition technique, good adhesion and less concentration of lattice defects [18].…”

Section: Introductionmentioning

confidence: 99%

Studies of structural and optical properties of sputtered SiC thin films

Mukesh Kumar

2024

Zas Mat

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The present study explored the deposition of amorphous silicon carbide (a-SiC) thin films on Si (100) and glass substrates using RF-magnetron sputtering. The sputtering power is changed from 100 to 250 W to study its influence on the characteristics of a-SiC thin films. Raman spectroscopy reveals the formation of a-SiC as well as carbon clusters. The film deposited at 100 W clearly shows the presence of both transverse optical (TO) and longitudinal optical (LO) phonon modes. The average roughness of the a-SiC films found to follow an increasing trend with increase in the sputtering power. The optical band gap of the a-SiC films measured by UV-Visible spectrophotometer was found to increase up to 2.45 eV with decrease in sputtering power. All a-SiC thin films were highly transparent. The Photoluminescence (PL) spectroscopy results were in agreement with the data observed by UV-Visible spectroscopy

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A Comprehensive Review of Recent Progress, Prospect and Challenges of Silicon Carbide and its Applications

Papanasam

Chanthini

et al. 2022

Silicon

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Structural and magnetic properties of pulsed laser deposited Fe–SiC thin films

Cited by 7 publications

References 31 publications

Influence of Iron Diffusion on the Oxidation Resistance of CrSiCN Hard Coatings

Influence of Iron Diffusion on the Oxidation Resistance of CrSiCN Hard Coatings

Studies of structural and optical properties of sputtered SiC thin films

A Comprehensive Review of Recent Progress, Prospect and Challenges of Silicon Carbide and its Applications

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