Recently, we demonstrated the solution deposition of ultrathin, high-mobility metal chalcogenide films using hydrazine or hydrazine/water mixtures as solvent. [1,2] The process involves forming soluble hydrazinium-based precursors of targeted metal chalcogenide semiconductors (e.g., SnS 2-x Se x ), spin-coating films of the precursors, and thermally decomposing the precursor films at low temperature to form the desired metal chalcogenides. Additionally, indium(III) selenide films have been spin-coated, using the corresponding hydrazinium precursor and mixed ethanolamine/dimethyl sulfoxide (DMSO) solvents rather than hydrazine.[3] Thin-film field-effect transistors (TFTs) have been prepared, based on the solution-deposited semiconducting chalcogenides, yielding n-type channels with mobilities in excess of 10 cm 2 V -1 s -1 -approximately an order of magnitude better than previous results for spin-coated or drop-cast semiconductors.[4-8] The higher mobilities may extend the application range for spin-coated films to higher-end devices than currently envisioned for analogous organic-based systems (e.g., very large area electronics, logic applications).In each of the previously reported spin-coated TFT channel layers, [1][2][3] the semiconductor has been a metal sulfide or selenide and the resulting electronic transport has been n-type. To further investigate the hydrazine-based precursor route to chalcogenide semiconductors and films, it is important to explore beyond the sulfides and the selenides and to identify high-mobility p-type systems to complement the n-type examples already demonstrated. Solar cells, for example, rely on the formation of a junction between n-and p-type layers (to drive charge separation at the interface) and the availability of both n-and p-type transistors is also critical for the realization of complementary metal-oxide semiconductor (CMOS) technology. Recently, we demonstrated the deposition of p-type ZnTe films from a hydrazine-based solution.[9] However, initial results employing these telluride-based films in transistors did not yield high mobility, perhaps because of poor grain structure or deleterious surface states in the ultrathin films. Films of p-type CuInSe 2 have similarly been deposited from a hydrazine-based solution, although again the performance of the devices was not in the range of the previous n-type systems (< 1 cm 2 V -1 s -1 ).