Structural and optical properties of titanium dioxide films deposited by reactive magnetron sputtering in pure oxygen plasma

Abstract

Photoluminescence spectroscopy and energy-level analysis of metal-organic-deposited Ga2O3:Cr3+ films J. Appl. Phys. 112, 063522 (2012) Electrical and optical properties of vanadium dioxide containing gold nanoparticles deposited by pulsed laser deposition Appl. Phys. Lett. 101, 133102 (2012) Controlling spatial distribution of thermal poling induced second-order optical nonlinearity with multilayered structures Appl. Phys. Lett. 101, 101101 (2012) Optical characteristic of sol-gel synthesized lead lanthanum titanate-cobalt iron oxide multiferroic composite thin film J. Appl. Phys. 112, 043520 (2012) Electrical and Fourier transform infrared properties of epitaxial SmNiO3 tensile strained thin film Titanium dioxide (TiO 2 ) thin films were deposited on unheated quartz (SiO 2 ) substrates in ''pure oxygen'' plasma by reactive radio-frequency ͑rf͒ magnetron sputtering. The structural and optical properties of deposited films were systematically studied by changing the deposition parameters, and it was very recently found that crystalline TiO 2 films grew effectively in pure O 2 atmosphere. For TiO 2 films deposited at a rf power P rf of 200 W, x-ray diffraction patterns show the following features: ͑a͒ no diffraction peak was observed at a total sputtering pressure p tot of 1.3 Pa; ͑b͒ rutile ͑110͒ diffraction was observed at 4.0 Pa, ͑c͒ the dominant diffraction was from anatase ͑101͒ planes, with additional diffraction from ͑200͒, under p tot between 6.7 and 13 Pa. For the deposition at 140 W, however, crystalline films with mixed phases were observed only between 4.0 and 6.7 Pa. The peaks of both the deposition rate and the anatase weight ratio for the films produced at 140 W were found at p tot of approximately 6.7 Pa. This suggests that the nucleation and growth of TiO 2 films were affected by the composition, density, and kinetic energy of the particles impinging on the substrate surface. The optical absorption edge analysis showed that the optical band gap E g and the constant B could sensitively detect the film growth behavior, and determine the film structure and optical absorption. The change in the shape of the fundamental absorption edge is considered to reflect the variation of density and the short-range structural modifications.

Effect of Sn doping on structural, optical, electrical and wettability properties of oriented ZnO nanorod arrays

“…The substrate absorbance was corrected by introducing an uncoated glass substrate. The optical band gap of the film determined using the Tauc's model [42]. …”

Ion beam induced chemical and morphological changes in TiO2 films deposited on Si(111) surface by pulsed laser deposition

“…TiO 2 thin films have been synthesized by using numerous methods including plasma oxidation [20], chemical vapor deposition (CVD) [21], metal organic chemical vapor deposition (MOCVD) [22], sputtering [23], atomic layer deposition (ALD) [24], plasmaenhanced ALD (PEALD) [25] and pulsed laser deposition (PLD) [26]. Among the above mentioned techniques, PLD provides thin films with good mechanical rigidity and with high specific surface area [27,28].…”

Structural, Dielectric and Optical properties of Sputtered TiO2 nano-films

“…TiO 2 films deposited at room temperature (303 K) were of X-ray amorphous. The as-deposited films were annealed in air for 1 hour at 1023 K. During DC reactive magnetron sputtering, the particles generally impinge on the substrate with energy in the range of 1-10 eV [16], which accelerates the growth of sputtered TiO 2 films with anatase or rutile phase [17]. The films formed at low sputtering power of 80 W showed four weak diffraction peaks were obtained (101), (110), (004) and (200) …”