Structural and optical properties of magnetron-sputtered Er-doped AlN films grown under negative substrate bias

Electric and pyroelectric properties of AlN thin films deposited by reactive magnetron sputtering on Si substrate

“…Due to the outstanding properties and versatility in application, numerous surface science studies have been dedicated to refine and advance techniques able to produce pure [1][2][3][4][5][6][7][8][9][10] and doped [11][12][13][14] high quality aluminum nitride layers, such as direct current [1,13], pulsed direct current [2,4] and radio-frequency [5,14] magnetron sputtering, pulsed laser deposition [3,12] or molecular beam epitaxy [9][10][11], and more recently, ion beam sputtering [6] or atomic layer deposition [7,8]. temperature variation.…”